2023
DOI: 10.1063/5.0144684
|View full text |Cite
|
Sign up to set email alerts
|

Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

Abstract: Grayscale lithography allows the creation of micrometer-scale features with spatially controlled height in a process that is fully compatible with standard lithography. Here, solid immersion lenses are demonstrated in silicon carbide using a fabrication protocol combining grayscale lithography and hard-mask techniques to allow nearly hemispherical lenses of 5μm radius to be etched into the substrate. Lens performance was benchmarked by studying the enhancement obtained in the optical collection efficiency for … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
5
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 8 publications
(5 citation statements)
references
References 73 publications
0
5
0
Order By: Relevance
“…Most of the magnetometry in SiC is based on DC magnetometry. For DC magnetometry based on ODMR, the most common approach used so far, higher sensitivity can be achieved by simply improving the photon collection efficiency using, for example, waveguides [56,171], nanopillars [172,173] and solid immersion lenses [174,175]. Another approach for increasing the spin read-out contrast for magnetometry in SiC defects could be based on achieving strong coupling by using high-Q macroscopic microwave cavities [176,177].…”
Section: Discussionmentioning
confidence: 99%
“…Most of the magnetometry in SiC is based on DC magnetometry. For DC magnetometry based on ODMR, the most common approach used so far, higher sensitivity can be achieved by simply improving the photon collection efficiency using, for example, waveguides [56,171], nanopillars [172,173] and solid immersion lenses [174,175]. Another approach for increasing the spin read-out contrast for magnetometry in SiC defects could be based on achieving strong coupling by using high-Q macroscopic microwave cavities [176,177].…”
Section: Discussionmentioning
confidence: 99%
“…The fabrication processes of microlens arrays include ultra-precision machining technologies [11][12][13][14][15], laser direct writing [16][17][18], grayscale lithography [19,20], nanoimprint lithography [21][22][23][24], and thermal reflow processes [25][26][27][28]. Ultra-precision machining technologies, such as single point diamond turning (SPDT), are capable of fabricating microstructures with complex morphology and excellent precision.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, the silicon monovacancies at hexagonal (V1) and cubic (V2) lattice sites in 4H-SiC attracted attention, since they implement optically active spin qubits in an industrial semiconductor material. Both, V1 and V2 centers show long spin coherence times, 1,2 and provide access to a nuclear spin qubit register based on 13 C and 29 Si species. 3,4 Both centers show robust optical properties with lifetime-limited linewidths up to temperatures of 20 K 5 for V2.…”
mentioning
confidence: 99%
“…This scenario can in principle happen for polarized nuclear spins. However, it is very unlikely that 7 out of 8 emitters are coupled to nearby nuclear spins and at the same time polarized in one energy level, considering that the sample contains only a limited number of nuclei with a nonzero magnetic moment, 4.7% of 29 Si and 1.1% of 13 C atoms. Second, we exclude an electric field originating from point defects (such as carbon vacancies) or foreign atoms (such as nitrogen atoms) in the local environment, which could shift the ground state spin levels via the Stark effect.…”
mentioning
confidence: 99%
See 1 more Smart Citation