Practical estimation of measurement noise and flatness deviation on focus variation microscopes

Giusca, Claudiu; Claverley, James D.; Sun, Wenjuan; Leach, Richard; Helmli, Franz; Chavigner, Mathieu P.J.

doi:10.1016/j.cirp.2014.03.086

Cited by 43 publications

(21 citation statements)

References 3 publications

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“…The study was to determine the dependence of selected lighting parameters on the results obtained from surface topography, which in turn would enable the selection of optimal settings for making correct measurements and reducing errors resulting from methodology. Similar studies are presented in Giusca et al (2014) and Le Goic et al (2016). The most important aim was to determine the polarizer's influence on the measurement of surface asperities and the impact of the polarized light's direction on surfaces with oriented structure (e.g., scratches, grooves).…”

Section: Purpose and Motivationsupporting

confidence: 87%

The Optical Aspect of Errors in Measurements of Surface Asperities Using the Optical Profilometry Method

et al. 2020

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The paper presents the impact of lighting type and direction on measurements of surface asperities using focus-variation microscopy. Particular attention was paid to the direction of lighting when using a light ring. It was pointed out that the lighting direction directly affects the values of the parameters Rt, Rz, and Rc. The article also presents the impact of a light polarizer on the surface topography parameters. It has been shown that the positioning of a sample with a regular and directed structure relative to the optical axis of the light polarizer affects the accuracy of mapping surface asperities. The largest differences were observed for Rz and Rt parameters. A method of using an external polarizer mounted on a focus variation microscope lens was also presented.

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Section: Purpose and Motivationsupporting

confidence: 87%

The Optical Aspect of Errors in Measurements of Surface Asperities Using the Optical Profilometry Method

et al. 2020

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“…de Groot [34] provides a thorough overview of the current state of standardisation of MCs and their potential benefit to instrument specification, and also comments on the inability of the current set of MCs to capture the response of the instrument when measuring a real part in the actual environment in which the system is intended to be used. In practice, the latter disadvantage is mitigated with the use of (1) gauge repeatability and reproducibility [34]; (2) the recent addition of a new MC currently called topography fidelity (see below) [155]; or, (3) by using instruments as comparators [54]. The first and third solutions diminish the calibration role of MCs, pushing their usage to the area of instrument performance verification, similar to the maximum permissible error (MPE) test common in the coordinate metrology field [76].…”

Section: The Current Iso Frameworkmentioning

confidence: 99%

Calibration and verification of areal surface texture measuring instruments

Leach

Giusca

Haitjema³

et al. 2015

CIRP Annals

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“…On the other hand, the positional relation curve can also be used to evaluate the torsional state of the surface. In the development of shape error detection methods, there are several novel methods are used to obtain straightness [1][2][3][4], flatness [5][6][7][8][9][10], roundness [11,12]. However, because the method of evaluating the parallelism in position error is relatively simple, there is relatively little research on this aspect.…”

Section: Introductionmentioning

confidence: 99%

A Method of On-Site Describing the Positional Relation between Two Horizontal Parallel Surfaces and Two Vertical Parallel Surfaces

Zhong-wu

Bao

et al. 2020

Applied Sciences

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The position error of two parallel surfaces is generally constrained by parallelism. However, as a range of change, it cannot represent the positional relation between two parallel surfaces. Large-scale equipment such as machine tools are complex and difficult to move. It is also an engineering problem to perform field measurements on it. To this end, a method of describing the positional relation between two horizontal parallel surfaces and two vertical parallel surfaces on-site is proposed in this paper, which is a novel kind of position error, enriching the form of parallel surface position error, and solves the inconvenience problem of large equipment position error measurement. The measurement mechanisms are designed, and the measurement principle is given. Firstly, the combined projection waveform of the measured surface can be obtained by the geometric relationship between the measurement mechanism and the measured surface. Secondly, an algorithm is studied to process the obtained waveform, and the combined projection curve of the measured surface is acquired. Then, under the condition of considering the shape contours of the two surfaces, an algorithm is developed to acquire the calculated shape contour of the measured surface. According to the difference between the calculated surface shape contour and the known shape contour of the measured surface, the positional relation of the two surfaces can be determined. Meanwhile, the mathematical models of algorithms are established, and the measurement experiments are carried out, and the algorithms are verified by the mutual measurement method of the two surfaces. The results show that this method can accurately obtain the positional relation of two horizontal parallel surfaces and two vertical parallel surfaces.

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Practical estimation of measurement noise and flatness deviation on focus variation microscopes

Cited by 43 publications

References 3 publications

The Optical Aspect of Errors in Measurements of Surface Asperities Using the Optical Profilometry Method

The Optical Aspect of Errors in Measurements of Surface Asperities Using the Optical Profilometry Method

Calibration and verification of areal surface texture measuring instruments

A Method of On-Site Describing the Positional Relation between Two Horizontal Parallel Surfaces and Two Vertical Parallel Surfaces

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