The implantation induced transition from the ordered to the disordered state of Ga0.52In0.48P/(Al0.35Ga0.65)0.5In0.5P–layers was investigated by means of Ar+ ion implantation, rapid thermal annealing (RTA) and photoluminescence spectroscopy. The implantation dose and annealing temperature dependence of the luminescence was studied in the dose range from 1×109 cm-2 to 5×1013 cm-2 and in the temperature range from 500°C up to 1025°C. By an Ar+ dose of 2×1012 cm-2 the temperature of the order-disorder transition can be decreased by about 200°C compared to the transition temperature of only annealed samples. For annealing temperatures higher than 700°C a dose variation by less than one order of magnitude causes an emission energy blue shift of the GaInP luminescence band by about 100 meV due to a complete disordering of the previously ordered layers.