Optical properties of amorphous Al2O3 thin films prepared by a sol–gel process

Hu, Baofu; Yao, Manwen; Xiao, Ruihua; Chen, Jianwen; Yao, Xi

doi:10.1016/j.ceramint.2014.05.148

Cited by 82 publications

(32 citation statements)

References 35 publications

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“…It is interesting to observe the appearance of one peak at 74.5–74.6 eV for all the spectra. Accordingly with a typical BE for Al 3+ 2p of 74.2 eV, our values are slightly displaced (ΔBE = +0.3 eV).…”

Section: Resultscontrasting

confidence: 44%

Effect of the coupling agent on the properties of poly(acrylic acid)−Al₂O₃ interpenetrating hybrids and sorption of metal ions

Campos

Torres

Urbano

et al. 2014

Polymer International

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New hybrid composites from poly[acrylic acid] (PAA) with Al2O3 oxide was obtained by radical polymerization/sol‐gel process using [3‐(trimethoxysilyl)propyl methacrylate] (TMPM) as organosilane coupling agent. TMPM form covalent bonds between polymer and inorganic phases giving materials with interpenetrating hybrid networks structures. The organic/inorganic hybrids have a good divalent cation retention capacity.

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Section: Resultscontrasting

confidence: 44%

Effect of the coupling agent on the properties of poly(acrylic acid)−Al₂O₃ interpenetrating hybrids and sorption of metal ions

Campos

Torres

Urbano

et al. 2014

Polymer International

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“…Al 2 O 3 film can be fabricated by several methods, including chemical vapor deposition [2], electron beam evaporation [3], magnetron sputtering [4], the sol-gel process [5], pulsed laser deposition [6], and atomic layer deposition [7]. Among these techniques, Atomic Layer Deposition (ALD), a low-temperature atomic chemical vapor deposition technique, has advantages in homogeneity, compactness, precise composition, and thickness controllability of the target material onÅgstrom or monolayer level [8,9].…”

Section: Introductionmentioning

confidence: 99%

Structural and Optical Properties of Amorphous Al₂O₃ Thin Film Deposited by Atomic Layer Deposition

Shi

Qian

Hou

et al. 2018

Advances in Condensed Matter Physics

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Aluminum oxide (Al 2 O 3 ) amorphous structure with short-range order and long-range disorder has presented promising applications in optical and optoelectronic devices. In this paper, the Al 2 O 3 films with different thickness were prepared by atomic layer deposition (ALD) technology at 200 ∘ C in order to achieve amorphous structure. X-ray diffraction (XRD) and energy dispersive spectrum (EDS) results indicated that the Al 2 O 3 films were amorphous structure and stable O/Al ratio. The surface topography investigated by atomic force microscopy (AFM) showed that the samples were smooth and crack-free. Spectroscopic ellipsometer (SE) measurements were operated to investigate the effect of thickness on the structure and optical properties of films with Tauc-Lorentz model. It is found that the band gap exhibits a steady value ∼2.3 eV by the UV-VIS transmittance method, but the T-L model was ∼3.0 eV. The refractive index and extinction coefficient are related to the variation of thickness and the samples surface quality of amorphous network structure in the thin films. The outstanding optoelectronic properties and facile fabrication of Al 2 O 3 films amorphous structure can be extended to other similar oxides, which could display wide applications in various engineering and industrial fields.

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“…In order to solve this problem, some gate dielectrics with higher dielectric constant than SiO 2 (k ¼ 3.9) have been paid more attention, such as Ta 2 O 5 , HfO 2 , Al 2 O 3 , TiO 2 , Y 2 O 3 , ZrO 2 , etc. [2][3][4][5][6][7][8][9][10]. Among these gate oxides, zirconium oxide (ZrO 2 ) is one of the attractive materials.…”

Section: Introductionmentioning

confidence: 99%

Microstructure, optical and electrical properties of solution-derived peroxo-zirconium oxide gate dielectrics for CMOS application

Xiao

Sun

et al. 2016

Ceramics International

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Optical properties of amorphous Al2O3 thin films prepared by a sol–gel process

Cited by 82 publications

References 35 publications

Effect of the coupling agent on the properties of poly(acrylic acid)−Al₂O₃ interpenetrating hybrids and sorption of metal ions

Effect of the coupling agent on the properties of poly(acrylic acid)−Al₂O₃ interpenetrating hybrids and sorption of metal ions

Structural and Optical Properties of Amorphous Al₂O₃ Thin Film Deposited by Atomic Layer Deposition

Microstructure, optical and electrical properties of solution-derived peroxo-zirconium oxide gate dielectrics for CMOS application

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Optical properties of amorphous Al2O3 thin films prepared by a sol–gel process

Cited by 82 publications

References 35 publications

Effect of the coupling agent on the properties of poly(acrylic acid)−Al2O3 interpenetrating hybrids and sorption of metal ions

Effect of the coupling agent on the properties of poly(acrylic acid)−Al2O3 interpenetrating hybrids and sorption of metal ions

Structural and Optical Properties of Amorphous Al2O3 Thin Film Deposited by Atomic Layer Deposition

Microstructure, optical and electrical properties of solution-derived peroxo-zirconium oxide gate dielectrics for CMOS application

Contact Info

Product

Resources

About

Effect of the coupling agent on the properties of poly(acrylic acid)−Al₂O₃ interpenetrating hybrids and sorption of metal ions

Effect of the coupling agent on the properties of poly(acrylic acid)−Al₂O₃ interpenetrating hybrids and sorption of metal ions

Structural and Optical Properties of Amorphous Al₂O₃ Thin Film Deposited by Atomic Layer Deposition