Optical Plasma Diagnostics During Reactive Magnetron Sputtering

Konstantinidis, Stéphanos; Gaillard, Mireille; Hecq, M.; Ricard, A.

doi:10.1007/978-3-540-76664-3_9

Cited by 7 publications

(6 citation statements)

References 55 publications

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“…These oxygen molecules are also ionized and produce some oxygen atoms by dissociation, which are in turn ionized. Time-resolved OESmeasurements support the notion of increased oxygen dissociation during the high-power pulse [25]. This concentration of atomic oxygen increases with a certain delay from the start of the pulse, as compared to the argon concentration.…”

Section: Hipims Pulsesupporting

confidence: 54%

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Leroy¹,

Konstantinidis²,

Mahieu³

et al. 2011

J. Phys. D: Appl. Phys.

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To cite this version:W P Leroy, S Konstantinidis, S Mahieu, R Snyders, D Depla. Angular-resolved energy flux measurements of a dc-and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere. Journal of Physics D: Applied Physics, IOP Publishing, 2011, 44 (11) A rotating cylindrical magnetron equipped with a titanium target, was sputtered in DC and in HIPIMS mode, both in metallic and in oxide regime. For all sputter modes, the same process conditions and the same average sputtering power of 300W were used. An angular-resolved study was performed, 90 degrees around the rotating cylindrical magnetron, which obtained the total energy flux arriving at the substrate. Furthermore, the energy flux per adparticle was calculated by measuring the deposition rate for all sputter modes and regimes. There is only a small difference in total arriving energy flux between the DC-mode and the HIPIMS mode. A maximum arriving energy flux of ca. 0.26 mW/cm 2 was measured, when normalized to the sputtering power. Concerning the deposition rate, up to a 75% decrease was found from DC to HIPIMS mode. Furthermore, the emission and the transport of the particles have a similar angular profile for all sputter modes. Among the HIPIMS modes, a decrease in deposition rate was measured with increasing pulse length. Therefore, the energy which arrives per adparticle is the highest for the HIPIMS modes. A difference in the angular shape of the energy per arriving adparticle is noticed between the DC and the HIPIMS modes. The DC mode has a maximum arriving energy per adparticle around 50 degrees, while this is at 60 degrees for the HIPIMS mode.

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Section: Hipims Pulsesupporting

confidence: 54%

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Leroy¹,

Konstantinidis²,

Mahieu³

et al. 2011

J. Phys. D: Appl. Phys.

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“…If a constant metal concentration throughout the film is required, the process should initially be run with a closed shutter in front of the magnetron source and with no high voltage applied to the sample holder until a steady state is reached. The state of the target poisoning can be controlled by means of optical spectrometry [26], for example, provided that there is a line of sight to the plasma in front of the magnetron sputter source.…”

Section: Preparation Process and Metal Contentmentioning

confidence: 99%

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Flege

Hatada

Hanauer

et al. 2017

Advances in Materials Science and Engineering

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Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C 2 H 4 ). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.

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“…The abovementioned variations of the plasma characteristics, which, in turn, impact the plasma-surface interaction, can be monitored by ad hoc plasma analysis measurements as described in [73][74][75][76].…”

Section: Introduction To Sputteringmentioning

confidence: 99%

Sputtering onto liquids: a critical review

Sergievskaya¹,

Chauvin²,

Konstantinidis³

2022

Beilstein J. Nanotechnol.

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Sputter deposition of atoms onto liquid substrates aims at producing colloidal dispersions of small monodisperse ultrapure nanoparticles (NPs). Since sputtering onto liquids combines the advantages of the physical vapor deposition technique and classical colloidal synthesis, the review contains chapters explaining the basics of (magnetron) sputter deposition and the formation of NPs in solution. This review article covers more than 132 papers published on this topic from 1996 to September 2021 and aims at providing a critical analysis of most of the reported data; we will address the influence of the sputtering parameters (sputter power, current, voltage, sputter time, working gas pressure, and the type of sputtering plasma) and host liquid properties (composition, temperature, viscosity, and surface tension) on the NP formation as well as a detailed overview of the properties and applications of the produced NPs.

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Optical Plasma Diagnostics During Reactive Magnetron Sputtering

Cited by 7 publications

References 55 publications

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

Sputtering onto liquids: a critical review

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