2015
DOI: 10.1063/1.4921058
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MoS2 on an amorphous HfO2 surface: An ab initio investigation

Abstract: The energetic stability, electronic and structural properties of MoS2 adsorbed on an amorphous a-HfO2 surface (MoS2/HfO2) are examined through ab initio theoretical investigations. Our total energy results indicate that the formation of MoS2/HfO2 is an exothermic process with an adsorption energy of 34 meV/Å2, which means that it is more stable than similar systems like graphene/HfO2 and MoS2/SiO2. There are no chemical bonds at the MoS2-HfO2 interface. Upon formation of MoS2/HfO2, the electronic charge distri… Show more

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Cited by 17 publications
(18 citation statements)
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“…For reference, the KPFM measurement helps confirm that the work function of graphene was approximately 4.581 eV (Figure c). Another possible explanation is the presence of charge puddles due to charged impurities and adsorbed polar molecules on the surface of SiO 2 , which is known to cause p-doping in 2D materials. We speculate that this charge-puddle effect probably enhanced the p-type properties of WSe 2 on SiO 2 to a greater extent compared to that of WSe 2 on graphene.…”
Section: Resultsmentioning
confidence: 95%
“…For reference, the KPFM measurement helps confirm that the work function of graphene was approximately 4.581 eV (Figure c). Another possible explanation is the presence of charge puddles due to charged impurities and adsorbed polar molecules on the surface of SiO 2 , which is known to cause p-doping in 2D materials. We speculate that this charge-puddle effect probably enhanced the p-type properties of WSe 2 on SiO 2 to a greater extent compared to that of WSe 2 on graphene.…”
Section: Resultsmentioning
confidence: 95%
“…To simulate experimentally relevant situations, the amorphous SiO2 (a-SiO2) bulk structure was further generated through the molecular dynamics (MD) simulations based on the VASP code following the same procedure as showed in detailed in literatures [55,56]. The WS2/SiO2 heterostructure was further simulated by constructing a repeated-slab model, including a-SiO2, (3×3)-WS2, and a 20 Å vacuum region.…”
Section: Resultsmentioning
confidence: 99%
“…The thermal stability of HfO 2 , melting point (2700 C), will be ideal for a high temperature graphene growth environment. A recent theoretical study showed that there is no chemical bonding at the graphene-HfO 2 interface and its energetic stability is ruled by the van der Waals interaction [9]. In addition, HfO 2 /graphene structures exhibited ultra high mobility compared to other oxide/graphene structures [10,11] and welldeveloped half-integer quantum Hall states and magnetoresistance oscillations [12], similar to that of pristine exfoliated graphene [8].…”
Section: Introductionmentioning
confidence: 99%