Mechanisms of elemental contamination in ion implantation equipment

Wauk, M.T.; Murrell, A.; Wagner, D.; Edwards, Peter R.

doi:10.1109/iit.1996.586146

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Mechanisms of elemental contamination in ion implantation equipment

Cited by 4 publications

References 5 publications

Issues of ultra shallow junction formation using sub-1 keV ion implantation

Issues of ultra shallow junction formation using sub-1 keV ion implantation

ENCOTION - A new simulation tool for energetic contamination analysis

Investigation of phosphorus contamination in <sup>49</sup>BF<sub>2</sub><sup>+</sup> implants

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