Focused ion beams with diameters of 8 to 50 nm are used for material processing in the nanoscale regime. In this paper, effects of the ion beam-solid interaction determining the formation of small structures by ion-beam sputtering and chemically assisted material deposition and etching are investigated. In the case of decreasing feature size, angle-dependent sputtering, a non-constant sputter rate, and scattered ions play an important role. The impact on side-wall angle, aspect ratio, and shape of the bottom of the etched structures is discussed. In beam tail regions, these effects will be especially pronounced, leading to material swelling instead of material removal. Ion beam assisted etching and deposition will face additional effects. For small structures, gas depletion becomes a significant drawback. The impact on gas depletion and the competition with sputtering are discussed

In this article, some limitations of the processing of structures with dimensions in the nanometer range by focused ion beams will be discussed. In order to enable exact depth control of nanometer structures, the effective sputter yield of silicon was determined as function of the ion dose. At ion doses below 10/sup 16/ cm/sup -2/, the effective sputter yield is not constant and the volume of the area processed increases due to the implantation of ions. Material removal can be measured for doses above 2x10/sup 16/ cm/sup -2/ and it reaches equilibrium for doses of about 3x10/sup 17/ cm/sup -2/. This dose dependence of the effective sputter yield becomes especially effective in beam tail regions with low ion intensity. The shape of nanostructures is further determined by combining the beam shape and the angle dependence of the sputter yield which was experimentally determined. Using this approach with a Gaussian beam shape, a comparison of simulated and measured sidewall angles has shown good agreement for trench structures. Only sidewall regions close to the surface and to the bottom of deep structures show slight deviations. At the surface, non-Gaussian beam tails lead to unintentional sputtering at the corners of the processed area. At the bottom, forward scattered ions lead to higher sputter erosio

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High-k dielectric layers (HfSixOy and ZrO2) with different film morphologies were investigated by tunneling atomic-force microscopy (TUNA). Different current distributions were observed for amorphous and nanocrystalline films by analyzing TUNA current maps. This even holds for crystalline layers where highly resolved atomic-force microscopy cannot detect any crystalline structures. However, TUNA enables the determination of morphology in terms of differences in current densities between nanocrystalline grains and their boundaries. The film morphologies were proven by high-resolution transmission electron microscopy. The investigations show TUNA as powerful current mapping tool for the characterization of morphology in thin high-k films on a nanoscale