2014
DOI: 10.1134/s106378421407010x
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Magnetron sputtering of thin Cu(200) films on Ni(200)/SiO2/Si substrates

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Cited by 6 publications
(1 citation statement)
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“…It has been considered as a very effective deposition method of thin film. [5][6][7][8][9][10][11][12][13] In this work, metallic silver (Ag) and titanium dioxide (TiO 2 ) films were deposited on a textile substrate by magnetron sputtering technology. Silver has excellent electrical, optical, and chemical properties, whereas titanium dioxide has high photocatalytic activity, good chemical stability, and environmental friendliness.…”
mentioning
confidence: 99%
“…It has been considered as a very effective deposition method of thin film. [5][6][7][8][9][10][11][12][13] In this work, metallic silver (Ag) and titanium dioxide (TiO 2 ) films were deposited on a textile substrate by magnetron sputtering technology. Silver has excellent electrical, optical, and chemical properties, whereas titanium dioxide has high photocatalytic activity, good chemical stability, and environmental friendliness.…”
mentioning
confidence: 99%