Local anodic oxidation of Ni films with (2 0 0) and (1 1 1) texture

Pavlova, A. Yu.; Nikulin, Yu. V.; Dzhumaliev, A. S.; Khivintsev, Yu. V.; Zaharov, A.A.; Preobrazhensky, V.; Pernod, Philippe; Filimonov, Yu. A.

doi:10.1016/j.apsusc.2015.04.111

Cited by 4 publications

(1 citation statement)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Since then, the type and chemical nature of the materials patterned or modified by o-SPL has considerably grown. It includes metals such as Ni [73] or Hf [74] to semiconductors such as SiC [75], to dielectrics such as Si 3 N 4 [76], to complex oxides such as LaBaMnO [77] and two-dimensional layered materials such as graphene [27], MoS 2 [78,79], WSe 2 [80] and other transition metal dichalcogenides [81]. Several self-assembled monolayers and polymers have also been patterned by o-SPL (see below).…”

Section: Nanopatterningmentioning

confidence: 99%

Advanced oxidation scanning probe lithography

Ryu

García

2017

Nanotechnology

View full text Add to dashboard Cite

Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomolecules. Oxidation SPL has also been applied to develop sophisticated electronic and nanomechanical devices such as quantum dots, quantum point contacts, nanowire transistors or mechanical resonators. Here, we review the principles, instrumentation aspects and some device applications of o-SPL. Our focus is to provide a balanced view of the method that introduces the key steps in its evolution, provides some detailed explanations on its fundamentals and presents current trends and applications. To illustrate the capabilities and potential of o-SPL as an alternative lithography we have favored the most recent and updated contributions in nanopatterning and device fabrication.

show abstract