LP‐8: Late News Poster: Ion Beam Sputter Deposition Process of Inorganic Vertical Alignment Layers

Abstract

The research results of silicon dioxide thin films alignment properties is presented. The films was deposited by oblique ion beam sputtering on glass substrate. Films thickness and angle condensation influences on the value of pretilt angle of liquid crystal vertical alignment mode is shown. Role of the surface morphology of alignment layers is discussed. The highly uniform vertical alignment layers can be produced using ion beam coating on the substrates with dimensions 300 × 400mm and more.

P‐113: Ferroelectric LC Aligned on SiO2 Thin Films Using the Ion Beam Deposition and its Applications

“…We deposited SiO 2 thin film on ITO-coated glass substrates by using oblique ion beam sputtering system [6][7]. It is based on the anode-layer ion source with the racetrack shape of the discharge area.…”

“…Compared with SiO x layer achieved by oblique evaporation technique, thin SiO 2 layers are more reliable using oblique ion beam deposition with large size substrates since ion beam with linear source theoretically has no limitations for oblique sputtering. This technique was used before to align nematic liquid crystal [6][7]. Now, this paper presents the results of investigation of the alignment of FLC materials on the SiO 2 films produced by the ion-beam deposition for LC devices.…”

Display thin‐film coatings produced by ion‐beam processing

“…It was found that oblique sputtering by the ion-beam technique provides alignment coatings of good quality for homeotropic LCs. 11 Also, it was found that the film thickness and the direction angle of the sputtered flow relative to the substrate surface are the main factors which determine the important alignment parameters such as the LC pretilt angle ( Figs. 11 and 12).…”