P‐113: Ferroelectric LC Aligned on SiO₂ Thin Films Using the Ion Beam Deposition and its Applications

Abstract

The uniform alignment of Ferroelectric LCs (FLC) on inorganic thin film surfaces can be obtained using oblique ion beam sputtering deposition on substrates. Large deposition angle from 60º to 80 º can be used for thin SiO 2 alignment layer, which thickness can vary from 5nm to 40 nm. Two types of uniform alignment of "chevron" (before electrical treatment) and "quazibookshelf" (after electrical treatment) were studied. The applications using this unique technology in low power consumption displays, fast switching color displays, future LCD-TVs and fiber optics are discussed. High quality alignment on large size substrates is also easily achieved because of the linear design of the ion beam sputtering source, which is a big challenge for FLC on SiO x layers before.SID 07 DIGEST • 625 ISSN/007-0966X/07/3801-0625-$1.00 © 2007 SID