Abstract— Liquid‐crystal (LC) alignment on SiOx films produced by ion‐beam sputtering deposition was comprehensively studied. The conditions for planar, tilted planar, homeotropic, and tilted homeotropic LC alignment of high uniformity were determined. The alignment photostability and aging issue are discussed. An original sputtering system based on the anode‐layer source excelling in high reliability and quality of sputtered coatings were used. Because this system can be easily scaled up, the alignment treatment of the large‐area alignment substrates, including those used in modern LCD manufacturing, can be realized. The advantages of the sputtering LC alignment technique, in comparison with its vapor‐deposition predecessor, are described.
The research results of silicon dioxide thin films alignment properties is presented. The films was deposited by oblique ion beam sputtering on glass substrate. Films thickness and angle condensation influences on the value of pretilt angle of liquid crystal vertical alignment mode is shown. Role of the surface morphology of alignment layers is discussed. The highly uniform vertical alignment layers can be produced using ion beam coating on the substrates with dimensions 300 × 400mm and more.
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