Display thin‐film coatings produced by ion‐beam processing

Abstract

Abstract— Thin films are one of the most important components in present‐day displays. In this paper, new developments in the field of thin‐film coating technology and techniques for display applications will be discussed. These are based on the use of powerful ion‐beam flows. Scanning linear sputtering systems have made it feasible to achieve uniform coating over large areas in a wide spectrum of coats. Examples of multilayer coatings to be used in the display‐based equipment obtained through the use of ion‐beam technology will be presented.

Second wind of the oblique deposition method of liquid-crystal alignment: Ion-beam sputtering technique

“…By using extended sputtering sources, one can produce coatings on the large-area films. 21 Finally, because of the substantial difference in the adatom's energy, sputtering deposition is not a simple alternative to vapor deposition, but a method of obtaining new functions of the alignment films. Despite a great deal of potential, the alignment properties of SD films are not discussed in detail.…”