2018
DOI: 10.1016/j.solmat.2018.03.002
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Light and elevated temperature induced degradation in p-type and n-type cast-grown multicrystalline and mono-like silicon

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Cited by 62 publications
(41 citation statements)
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“…The LeTID phenomenon has been observed on all different material types ranging from p-type multicrystalline silicon [1], Cz silicon [6], [7], cast-mono silicon [8], and even float-zone silicon [9], [10] to various n-type materials [8], [11]- [13]. All the materials have in common that in order to be susceptible to LeTID, a during the firing step (or hydrogen must be introduced otherwise [14,15]), and that the LeTID, and that the LeTID extent is highly sensitive to the peak firing temperature.…”
mentioning
confidence: 99%
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“…The LeTID phenomenon has been observed on all different material types ranging from p-type multicrystalline silicon [1], Cz silicon [6], [7], cast-mono silicon [8], and even float-zone silicon [9], [10] to various n-type materials [8], [11]- [13]. All the materials have in common that in order to be susceptible to LeTID, a during the firing step (or hydrogen must be introduced otherwise [14,15]), and that the LeTID, and that the LeTID extent is highly sensitive to the peak firing temperature.…”
mentioning
confidence: 99%
“…The This work is licensed under a Creative Commons Attribution 4.0 License. For more information, see https://creativecommons.org/licenses/by/4.0/ LeTID kinetics appear to depend on the material type [8]- [10]. Whether this is a result of the difference in the crystalline structure, the difference in the present impurities, or whether this indicates a fundamental difference in the LeTID defect itself has not been clarified yet.…”
mentioning
confidence: 99%
“…The differences seen between the maximum BOcorrected degradations indicates that LeTID formation starts to be observed after passing through a 640°C "barrier", illustrated in Figure 49(b). C. Chan et al [144] states that the LeTID is triggered if peak temperatures exceed approximately 700°C. This is because they found a considerably higher degradation in the sample fired at 700°C then in the sample fired at 675°C.…”
Section: A Methods Proposed For Letid and Bo-lid Separationmentioning
confidence: 99%
“…LeTID is commonly evaluated by the degradation behavior of the minority charge carrier lifetime in wafers [141], [142], [143], [144], [77], or the performance of cells [145], [140], [31], using illumination at an elevated temperature. Figure 24 shows the Kersten et al [31] data for mc-PERC cells degradation after illumination at 300W.…”
Section: Bo-lid and Letid In P-type Mc-simentioning
confidence: 99%
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