ITO thin films deposited by advanced pulsed laser deposition

Viespe, Cristian; Nicolae, Ionut; Sima, Cornelia; Grigoriu, C.; Medianu, R.

doi:10.1016/j.tsf.2007.03.167

Cited by 50 publications

(21 citation statements)

References 10 publications

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“…ITO is a direct gap semiconductor with n type con ductivity caused by oxygen vacancies and Sn 4+ ions that exhibit donor properties [2]. ITO films are syn thesized by various methods: vapor phase deposition [3,4], magnetron sputtering [5][6][7], the sol-gel method [8], layer by layer atomic deposition [9], and other methods.…”

Section: Introductionmentioning

confidence: 99%

Pulsed laser deposition of ITO thin films and their characteristics

et al. 2012

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The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser dep osition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentration in the target. The transmittance of grown ITO films in the visible spectral region exceeds 85%. The minimum value of resistivity 1.79 × 10 -4 Ω cm has been achieved in the ITO films with content of Sn 5 at %.

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Section: Introductionmentioning

confidence: 99%

Pulsed laser deposition of ITO thin films and their characteristics

et al. 2012

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“…So far, many methods have been used to deposit ITO thin films, such as pulsed laser deposition (PLD) [4,5], sputtering [6], e-beam evaporation (EBE) [7], sol-gel technique [8], and spray pyrolysis [9,10]. Among all these methods, e-beam evaporation has the advantages of low cost, low temperature, high purity and high deposition rate [1,7].…”

Section: Introductionmentioning

confidence: 99%

Indium tin oxide thin films for silicon-based electro-luminescence devices prepared by electron beam evaporation method

Wan¹,

Wang²,

Sun³

et al. 2010

Journal of Non-Crystalline Solids

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“…Various deposition methods, such as reactive magnetron sputtering [4], pulsed laser deposition [5], electron beam evaporation [6], and ion beam deposition [7] have been used to deposit transparent conducting oxides (TCO), such as those in ITO films. Among these deposition technologies, reactive magnetron sputtering has received a great deal of attention for the preparation of TCO films due to several apparent advantages such as a high deposition rate on large area substrates and easily controllable film composition.…”

Section: Introductionmentioning

confidence: 99%