Influence of nickel thickness on the properties of ITO/Ni/ITO thin films

Park, J.H.; Chae, J.H.; Kim, Daeil

doi:10.1016/j.jallcom.2008.11.065

Cited by 42 publications

(11 citation statements)

References 14 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…J. Park previously reported a similar result where a noble Ni interlayer enhanced the surface flatness of ITO/Ni/ITO trilayer films [8].…”

Section: (A) (B) (C) (D) (E)supporting

confidence: 56%

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Gong¹,

Moon²,

Kim³

2016

Transactions on Electrical and Electronic Materials

Self Cite

View full text Add to dashboard Cite

ZnSnO 3 (ZTO)/Ag/ ZnSnO 3 (ZTO) trilayer films were prepared on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering. The electrical resistivity and optical transmittance of the films were investigated as a function of the Ag interlayer thickness. ZTO films with a 15 nm thick Ag interlayer show the highest average visible transmittance (83.2%) in the visible range. In this study, the highest figure of merit (2.1×10 -2 Ω cm) is obtained with the ZTO 50 nm/Ag 15 nm/ZTO 50 nm films.The enhanced optical and electrical properties of ZTO films with a 15 nm thick Ag interlayer are attributed to the crystallization of the Ag interlayer, as supported by the distinct XRD pattern of the Ag (111) peaks. From the observed results, higher optical and electrical performance of the ZTO film with a 15 nm thick Ag interlayer seems to make a promising alternative to conventional transparent conductive ITO films.

show abstract

“…J. Park previously reported a similar result where a noble Ni interlayer enhanced the surface flatness of ITO/Ni/ITO trilayer films [8].…”

Section: (A) (B) (C) (D) (E)supporting

confidence: 56%

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Gong¹,

Moon²,

Kim³

2016

Transactions on Electrical and Electronic Materials

Self Cite

View full text Add to dashboard Cite

show abstract

“…The RMS roughness of the GZO films was 1.8 nm, while GZO films with a 2 nm thick Ni inter layer showed a lower RMS roughness of 1.0 nm. Similarly, Park also reported that a Ni interlayer enhances the surface flatness of upper ITO films deposited with RF and DC magnetron sputtering at room temperature [11].…”

Section: Resultsmentioning

confidence: 72%

Influence of a Ni interlayer on the optical and electrical properties of trilayer GZO/Ni/GZO films

Heo

Jeon

Gong

et al. 2015

Ceramics International

Self Cite

View full text Add to dashboard Cite

“…In a previous study, J. Park reported that a Ni interlayer in ITO/Ni/ITO multilayer films also promotes the flatness of the upper ITO films [8]. Table 2 shows the influence of the TiO 2 buffer layer on the electrical properties of the films.…”

Section: Resultsmentioning

confidence: 97%

Effect of a TiO₂Buffer Layer on the Properties of ITO Films Prepared by RF Magnetron Sputtering

Kim

2013

Transactions on Electrical and Electronic Materials

Self Cite

View full text Add to dashboard Cite

Sn-doped In 2 O 3 (ITO) thin films were prepared by radio frequency magnetron sputtering without intentional substrate heating on bare glass and TiO 2 -deposited glass substrates to investigate the effect of a TiO 2 buffer layer on the electrical and optical properties of ITO films. The thicknesses of TiO 2 and ITO films were kept constant at 5 and 100 nm, respectively. As-deposited ITO single layer films show an optical transmittance of 75.9%, while ITO/TiO 2 bilayered films show a lower transmittance of 76.1%. However, as-deposited ITO/TiO 2 films show a lower resistivity (9.87×10 -4 Ωcm) than that of ITO single layer films. In addition, the work function of the ITO film is affected by the TiO 2 buffer layer, with the ITO/TiO 2 films having a higher work-function (5.0 eV) than that of the ITO single layer films. The experimental results indicate that a 5-nm-thick TiO 2 buffer layer on the ITO/TiO 2 films results in better performance than conventional ITO single layer films.

show abstract

Influence of nickel thickness on the properties of ITO/Ni/ITO thin films

Cited by 42 publications

References 14 publications

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Influence of a Ni interlayer on the optical and electrical properties of trilayer GZO/Ni/GZO films

Effect of a TiO₂Buffer Layer on the Properties of ITO Films Prepared by RF Magnetron Sputtering

Contact Info

Product

Resources

About

Influence of nickel thickness on the properties of ITO/Ni/ITO thin films

Cited by 42 publications

References 14 publications

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Influence of a Ni interlayer on the optical and electrical properties of trilayer GZO/Ni/GZO films

Effect of a TiO2Buffer Layer on the Properties of ITO Films Prepared by RF Magnetron Sputtering

Contact Info

Product

Resources

About

Effect of a TiO₂Buffer Layer on the Properties of ITO Films Prepared by RF Magnetron Sputtering