Digest. International Electron Devices Meeting,
DOI: 10.1109/iedm.2002.1175835
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I-MOS: a novel semiconductor device with a subthreshold slope lower than kT/q

Abstract: One of the "fundamental" problems in the continued scaling of MOSFETs is the 60 mV/decade room temperature limit in subthreshold slope. In this paper, we report initial studies on a new kind of transistor, the I-MOS. The I-MOS uses modulation of the breakdown voltage of a gated p-i-n structure in order to switch from the OFF to the ON state and vice versa. Since impact-ionization is an abrupt function of the electric field (or the carrier energy), simulations show that the device has a subthreshold slope much … Show more

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Cited by 263 publications
(143 citation statements)
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“…4 In recent years, numerous studies have examined various approaches to overcome this limit of 60 mV/dec. [4][5][6][7][8] Of these, two approaches are considered the most promising. One is the use of tunneling FET, an ambipolar device in principle that exhibits a p-type behavior with dominant hole conduction and an n-type behavior with dominant electron conduction.…”
Section: Introductionmentioning
confidence: 99%
“…4 In recent years, numerous studies have examined various approaches to overcome this limit of 60 mV/dec. [4][5][6][7][8] Of these, two approaches are considered the most promising. One is the use of tunneling FET, an ambipolar device in principle that exhibits a p-type behavior with dominant hole conduction and an n-type behavior with dominant electron conduction.…”
Section: Introductionmentioning
confidence: 99%
“…Ferroelectric gate materials [49] have been proposed to leverage an effective negative oxide capacitance to magnify channel surface potential modulation with gate voltage; although tantalizing, such an effect has yet to be confirmed experimentally. Very steep subthreshold characteristics have been demonstrated [50], [51] using nonthermionic mechanisms based on impact ionization or positive feedback, but these devices require large (> 1 V) sourceto-drain biases and suffer from fundamental drawbacks in switching speed and reliability. The most promising steep subthreshold slope devices appear to be tunneling transistors, which operate via the principle of gate-controlled band-to-band tunneling.…”
Section: B Sub-60 Mv/decade Inverse Subthreshold Slope Tunneling Fetsmentioning
confidence: 99%
“…Sub 60mV/decade value of subthreshold swing is possible for these two modes of carrier transport [4]. The impact ionization MOSFET appeared to be very promising due to its near ideal switching characteristics [5]. But problems like threshold voltage shift caused by hot carrier injection, non-rail to rail voltage swings, and high operating voltage requirements will arise in Impact ionization MOSFETS [2].…”
Section: Introductionmentioning
confidence: 99%