2012 4th IEEE International Memory Workshop 2012
DOI: 10.1109/imw.2012.6213670
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Highly Reliable Flash Memory with Self-Aligned Split-Gate Cell Embedded into High Performance 65nm CMOS for Automotive & Smartcard Applications

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Cited by 15 publications
(6 citation statements)
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“…As a first case consider a system similar to the one modeled in [6] where in (8) and ( 9) we have n 512, f s 360 Hz and b x 11; the compression stage refers to (10) and for the dispatch stage with b y 11 we consider (12) where data are stored in a FLASH memory [22]. The overall power consumption W is…”
Section: Dispatch Stagementioning
confidence: 99%
See 1 more Smart Citation
“…As a first case consider a system similar to the one modeled in [6] where in (8) and ( 9) we have n 512, f s 360 Hz and b x 11; the compression stage refers to (10) and for the dispatch stage with b y 11 we consider (12) where data are stored in a FLASH memory [22]. The overall power consumption W is…”
Section: Dispatch Stagementioning
confidence: 99%
“…Then, define few convex subsets of the space of n ¢ n matrices, namely C PSD containing matrices satisfying ( 5) and ( 6), C Ave containing matrices satisfying (5) as well as ( 16), C Ter containing matrices satisfying ( 5) and ( 17), and C Loc containing matrices satisfying (5) and (22).…”
Section: A Solving T-rltmentioning
confidence: 99%
“…Simple comparison with respect to erasecoupling-ratio among several NVM cells is shown. New 1.5T-flash (type-C) shows high erase coupling ratio than other types (type-A, type-B) [1,4,5]. Poly-to-poly erase operation in type-C decouples unselected cells, resulting in immunity to disturbance contrary to bulk erase operation in type-A and type-B.…”
Section: Electrical Results and Discussionmentioning
confidence: 99%
“…4 (2015) angle structure around a source contact that is not conductive optically. [33][34][35] Accordingly, a self-aligned contact (SAC) technology has been introduced to enable a NOR cell at approximately 45 nm. [33] The SAC architecture can further scale down the NOR cell by introducing patterning-friendly line/space features rather than 1D holes to form drain plugs, and by allowing the direct proximity of drain plugs over the gate spacer.…”
Section: Physical Scaling Challengingmentioning
confidence: 99%