2010 International Electron Devices Meeting 2010
DOI: 10.1109/iedm.2010.5703430
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High performance 22/20nm FinFET CMOS devices with advanced high-K/metal gate scheme

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Cited by 71 publications
(35 citation statements)
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“…Pseudo-random sequence with equal probability of all transitions (data Impact of Technology Scaling on the Minimum Energy Point for FinFET Based Flip-Flops activity rate 0.5) is considered in power consumption calculation to reflect average internal power consumption given the uniform data distribution. PTM-MG used the published results from foundries such as Intel, TSMC, and IBM [16][17][18][19] to extract the fitting PTM parameters such as DIBL, sub-threshold slope by fine-tuning both primary parameters (Gate length, Fin thickness, Fin height, and Fin pitch) and secondary parameters (Gate work function, channel doping, source-drain channel coupling, and DIBL coefficient) [11] to match on-current and offcurrent of the published results.…”
Section: Simulation Setupmentioning
confidence: 99%
“…Pseudo-random sequence with equal probability of all transitions (data Impact of Technology Scaling on the Minimum Energy Point for FinFET Based Flip-Flops activity rate 0.5) is considered in power consumption calculation to reflect average internal power consumption given the uniform data distribution. PTM-MG used the published results from foundries such as Intel, TSMC, and IBM [16][17][18][19] to extract the fitting PTM parameters such as DIBL, sub-threshold slope by fine-tuning both primary parameters (Gate length, Fin thickness, Fin height, and Fin pitch) and secondary parameters (Gate work function, channel doping, source-drain channel coupling, and DIBL coefficient) [11] to match on-current and offcurrent of the published results.…”
Section: Simulation Setupmentioning
confidence: 99%
“…In order to achieve better electrostatic control and reduce short channel effects, FinFETs have been successfully used for the 22-nm technology node [5]. To achieve an even better electrostatic control [6], vertically-stacked Silicon NanoWire FETs (SiNWFETs) with gate-all-around control have shown to be a natural extension of FinFETs.…”
Section: Introductionmentioning
confidence: 99%
“…Numerous enabling approaches such as high-κ/metal gate [2,3] and FinFET [4,5] have been used. Since the dynamic power dissipation of CMOS logic is proportional to the square of supply voltage VDD, VDD scaling provides a way to constrain power dissipation of integrated circuits (ICs).…”
Section: Digital Circuitsmentioning
confidence: 99%