2003
DOI: 10.1116/1.1630329
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Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

Abstract: Focused-ion-beam chemical vapor deposition (FIB-CVD) is an excellent technology for forming three-dimensional nanostructures. Various diamond-like-carbon (DLC) free-space-wirings have been demonstrated by FIB-CVD using a computer-controlled pattern generator, which is a commercially available pattern generator for electron-beam (EB) lithography. The material composition and crystal structure of DLC free-space-wiring were studied by transmission-electron microscopy and energy-dispersive x-ray spectroscopy. As a… Show more

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Cited by 125 publications
(78 citation statements)
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“…4 Alternatively, three-dimensional diamondlike carbon (DLC) structures can be fabricated by FIB-assisted chemical vapor deposition (FIB-CVD) using penanthrene (C 14 H 10 ) as a precursor. 20,21 This technique can be used to either plug the fill hole with DLC or to grow a fill tube directly above the fill hole. The latter approach has the advantage of a glueless joint between the fill tube and the capsule.…”
Section: Resultsmentioning
confidence: 99%
“…4 Alternatively, three-dimensional diamondlike carbon (DLC) structures can be fabricated by FIB-assisted chemical vapor deposition (FIB-CVD) using penanthrene (C 14 H 10 ) as a precursor. 20,21 This technique can be used to either plug the fill hole with DLC or to grow a fill tube directly above the fill hole. The latter approach has the advantage of a glueless joint between the fill tube and the capsule.…”
Section: Resultsmentioning
confidence: 99%
“…This limitation can be addressed in part with techniques such as multiple-angled exposures, as used in creating arrays of sharp vertical wedge-shaped structures for adhesion (Santos et al 2007). Other promising techniques include chemical vapour deposition induced by focused ion beams (FIB-CVD), which can create almost arbitrary three-dimensional geometries out of many different materials with feature sizes of the order of 80 nm (Morita et al 2003). This technology permits both material addition and removal.…”
Section: Multi-materials Fabrication Methods Challenges and Opportunimentioning
confidence: 99%
“…Material is then milled by blasting the surface with accelerated Gallium ions [72]. The speed of FIB milling is inversely related to the achieved resolution.…”
Section: 4) Focused Ion Beam Lithography and Millingmentioning
confidence: 99%