Cubic boron nitride (cBN) has a number of highly desirable mechanical, thermal, electrical, and optical properties. Because of this, there has been an extensive worldwide effort to synthesize thin films of cBN. Film synthesis is difficult in that without significant levels of ion bombardment during growth, only sp2-bonded BN forms, not sp3-bonded cBN. Recently there has been considerable progress in improving the deposition techniques and cBN film quality. In addition, progress has been made in understanding how energetic deposition conditions can lead to cBN formation. However, unanswered questions remain and process improvements are still needed. In this paper we critically and comprehensively review recent developments in cBN film synthesis and characterization. First, the structures and stability of the BN phases and characterization techniques are described. Next, the key experimental parameters controlling cBN film formation and synthesis techniques are discussed. Following a review of microstructure, the proposed mechanisms of cBN formation and the observed mechanical and electrical properties of cBN films are analyzed. We conclude by highlighting the current impediments to the practical realization of cBN-film technology. 0 1997 Published by Elsevier Science S.A.

We have developed a process for making thick, stress-free, amorphous-tetrahedrally bonded carbon (a-tC) films with hardness and stiffness near that of diamond. Using pulsed-laser deposition, thin a-tC films (0.1–0.2 μm) were deposited at room temperature. The intrinsic stress in these films (6–8 GPa) was relieved by a short (2 min) anneal at 600 °C. Raman and electron energy-loss spectra from single-layer annealed specimens show only subtle changes from as-grown films. Subsequent deposition and annealing steps were used to build up thick layers. Films up to 1.2 μm thick have been grown that are adherent to the substrate and have low residual compressive stress (<0.2 GPa). The values of hardness and modulus determined directly from an Oliver–Pharr analysis of nanoindentation experimental data were 80.2 and 552 GPa, respectively. We used finite-element modeling of the experimental nanoindentation curves to separate the “intrinsic” film response from the measured substrate/film response. We found a hardness of 88 GPa and Young’s modulus of 1100 GPa. From these fits, a lower bound on the compressive yield stress of diamond (∼100 GPa) was determined.

The elastic constants of single-crystal NbN, VN, and TiN films were determined from surface acoustic wave (SAW) dispersion curves obtained by the use of an acoustic microscope with a line-focus beam. Measurements were carried out for single-crystal nitride films grown on the (001) plane of single-crystal cubic-symmetric MgO substrates. The phase velocities measured as functions of the angle of propagation display the expected anisotropy. Dispersion curves of SAWs propagating along the symmetry axes were obtained by measuring the wave velocities for various film thicknesses and frequencies. Using a modified simplex method, an inversion of the SAW dispersion data yielded the elastic constants of cubic symmetry, namely c11, c12, and c44. The Rayleigh surface wave velocities calculated from the determined elastic constants and known mass densities agree well with a result measured by Brillouin scattering spectroscopy reported elsewhere.

A new generation of hollow waveguide (HWG) gas cells of unprecedented compact dimensions facilitating low sample volumes suitable for broad- and narrow-band mid-infrared (MIR; 2.5-20 μm) sensing applications is reported: the substrate-integrated hollow waveguide (iHWG). iHWGs are layered structures providing light guiding channels integrated into a solid-state substrate material, which are competitive if not superior in performance to conventional leaky-mode fiber optic silica HWGs having similar optical pathlengths. In particular, the provided flexibility in device and optical design and the wide variety of manufacturing strategies, substrate materials, access to the optical channel, and optical coating options highlight the advantages of iHWGs in terms of robustness, compactness, and cost-effectiveness. Finally, the unmatched modularity of this novel waveguide approach facilitates tailoring iHWGs to almost any kind of gas sensor technology providing adaptability to the specific demands of a wide range of sensing scenarios. Device fabrication is demonstrated for the example of a yin-yang-shaped gold-coated iHWG fabricated within an aluminum substrate with a footprint of only 75 mm × 50 mm × 12 mm (L × W × H), yet providing a nominal optical absorption path length of more than 22 cm. The analytical utility of this device for advanced MIR gas sensing applications is demonstrated for the gaseous constituents butane, carbon dioxide, cyclopropane, isobutylene, and methane.

Ion-assisted pulsed laser deposition has been used to produce films containing ≳85% sp3-bonded cubic boron nitride (c-BN). By ablating from a target of hexagonal boron nitride (h-BN), BN films have been deposited on heated (50–800 °C) Si(100) surfaces. The growing films are irradiated with ions from a broad beam ion source operated with Ar and N2 source gasses. Successful c-BN synthesis has been confirmed by Fourier transform infrared (FTIR) spectroscopy, high-resolution transmission electron microscopy (TEM), selected-area electron diffraction, electron energy-loss spectroscopy, and x-ray diffraction. The films are polycrystalline and show grain sizes up to 300 Å. In addition, Rutherford backscattering, elastic recoil detection, and Auger electron spectroscopies have been used to further characterize the samples. The effects of varying ion current density, substrate growth temperature, growth time, and ion energy have been investigated. It is found that stoichiometric films with a high c-BN percentage can be grown between 150 and 500 °C. Below ∼150 °C, the c-BN percentage drops dramatically, and the deposited film is completely resputtered at the current densities and ablation deposition rates used. As the deposition temperature rises above ∼500 °C the c-BN percentage also drops, but less dramatically than at low temperatures. In addition, the IR-active c-BN mode narrows considerably as the deposition temperature increases, suggesting that the c-BN material has fewer defects or larger grain size. It is found that films with a high c-BN percentage are deposited only in a narrow window of ion/atom arrival values that are near unity at beam energies between 800 and 1200 eV. Below this window the deposited films have a low c-BN percentage, and above this window the deposited film is completely resputtered. Using FTIR analysis, it is found that the c-BN percentage in these samples is dependent upon growth time. The initial deposit is essentially all sp2-bonded material and sp3-bonded material forms above this layer. Consistently, cross-section TEM samples reveal this layer to consist of an amorphous BN layer (∼30 Å thick) directly on the Si substrate followed by highly oriented turbostratic BN (∼300 Å thick) and finally the c-BN layer. The h-BN/t-BN interfacial layer is oriented with the 002 basal planes perpendicular to the plane of the substrate. Importantly, the position of the c-BN IR phonon changes with growth time. Initially this mode appears near 1130 cm−1 and decreases with growth time to a constant value of 1085 cm−1. Since in bulk c-BN the IR mode appears at 1065 cm−1, a large compressive stress induced by the ion bombardment is suggested. Possible mechanisms are commented on for the conversion process to c-BN based upon the results.