1997
DOI: 10.1063/1.120515
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Thick stress-free amorphous-tetrahedral carbon films with hardness near that of diamond

Abstract: We have developed a process for making thick, stress-free, amorphous-tetrahedrally bonded carbon (a-tC) films with hardness and stiffness near that of diamond. Using pulsed-laser deposition, thin a-tC films (0.1–0.2 μm) were deposited at room temperature. The intrinsic stress in these films (6–8 GPa) was relieved by a short (2 min) anneal at 600 °C. Raman and electron energy-loss spectra from single-layer annealed specimens show only subtle changes from as-grown films. Subsequent deposition and annealing steps… Show more

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Cited by 298 publications
(122 citation statements)
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“…Additionally, the second order Raman peak for silicon at ϳ960 cm −1 decreases with increasing annealing temperature, indicating increased absorption of the ta-C film, presumably from the increased threefold carbon content which has a higher absorption cross section for the Raman process. 5 The comparison between the NEXAFS spectra and the Raman spectra leads to important conclusions. First, because NEXAFS is a more surface-sensitive technique and Raman samples more of the bulk of the sample, the similar trends observed from both techniques suggest that the ta-C samples are being modified both at the surface and deeper into their bulk.…”
Section: Resultsmentioning
confidence: 99%
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“…Additionally, the second order Raman peak for silicon at ϳ960 cm −1 decreases with increasing annealing temperature, indicating increased absorption of the ta-C film, presumably from the increased threefold carbon content which has a higher absorption cross section for the Raman process. 5 The comparison between the NEXAFS spectra and the Raman spectra leads to important conclusions. First, because NEXAFS is a more surface-sensitive technique and Raman samples more of the bulk of the sample, the similar trends observed from both techniques suggest that the ta-C samples are being modified both at the surface and deeper into their bulk.…”
Section: Resultsmentioning
confidence: 99%
“…Since ta-C is a desirable material for MEMS, post-deposition stress relief is critical. With suitable control of film deposition, 100% stress relief ͑down to zero Ϯ10 MPa͒ can be achieved in these films by either thermal annealing 5,12 for a period of minutes at a temperature of ϳ650°C or laser annealing at higher temperatures for nanoseconds. 20 High-quality ta-C films can also be deposited using the filtered cathodic arc method.…”
Section: Introductionmentioning
confidence: 99%
“…A constant loading rate of 30 mN/s was applied. Nanohardness and Young's modulus values were measured as a function of indentation depth, and were determined using a modified Oliver-Pharr model [49].…”
Section: Experimental Methodsmentioning
confidence: 99%
“…However, DLC is an amorphous material with K=0.2 -3.5 W/mK at RT [25], which is a very low value Graphene-on-Diamond: Carbon sp 2 -on-sp 3 Technology, UCR and ANL, Nano Letters (2012) 6 even compared to SiO 2. Depending on H content, as-deposited DLC films have high internal stress, which needs to be released by annealing at higher T~600 o C [26]. These facts provide strong motivations for the search of other carbon materials, which can be used as substrates for graphene devices.…”
mentioning
confidence: 99%