2014
DOI: 10.1021/nl500299h
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Few-Electron Edge-State Quantum Dots in a Silicon Nanowire Field-Effect Transistor

Abstract: We investigate the gate-induced onset of few-electron regime through the undoped channel of a silicon nanowire field-effect transistor. By combining low-temperature transport measurements and self-consistent calculations, we reveal the formation of one-dimensional conduction modes localized at the two upper edges of the channel. Charge traps in the gate dielectric cause electron localization along these edge modes, creating elongated quantum dots with characteristic lengths of ∼10 nm. We observe single-electro… Show more

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Cited by 91 publications
(89 citation statements)
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References 29 publications
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“…Corner state quantum dots in Si nanowire transistors have been reported for different single and double gate topologies [9][10][11] and using both quantum dots and dopants [12]. In our novel quadruple gate configuration, we first of all confirm the creation of a single QD under a top-gate using gate G 1 as an example.…”
supporting
confidence: 53%
“…Corner state quantum dots in Si nanowire transistors have been reported for different single and double gate topologies [9][10][11] and using both quantum dots and dopants [12]. In our novel quadruple gate configuration, we first of all confirm the creation of a single QD under a top-gate using gate G 1 as an example.…”
supporting
confidence: 53%
“…Owing to this so-called corner effect, electron accumulation in silicon NWFETs 38 happens first at the top most corners. In addition, potential irregularities along the transport direction 39,40 confine these corner channels creating a parallel double quantum dot as schematically displayed in Fig. 1a.…”
Section: Resultsmentioning
confidence: 99%
“…The first few holes do not localize in edge states as in Ref. [24] because the channel is doped with Boron atoms and the back gate is grounded, therefore the hole are not pulled in the upper corners. They might rather be bound to clusters of two or more nearby Boron impurities which exist in the doped channel.…”
mentioning
confidence: 92%