Ferroelectric Film Synthesis, Past and Present: A Select Review

Abstract

A review of the history of ferroelectric (FE) thin film synthesis is given covering the period of the 1960's to the present. Early methods, materials and applications are discussed. An assessment of the recent upsurge in activity takes note of current targeted applications, including nonvolatile memory, piezoelectric actuators, capacitors, and electro-optic devices. Focus is placed on similarities and differences in the most common film deposition processes. Comparison of microstructure and composition variation seen in films deposited by sputtering, laser ablation, and solution deposition is made. More detailed understanding of process-microstructure relations is stressed as necessary for film property control. Also discussed are the roles of substrate interactions and interface layers in thin film growth.

Linear and nonlinear optical properties of (Pb,La)(Zr,Ti)O3ferroelectric thin films grown by radio-frequency magnetron sputtering

“…A variety of techniques, including radio-frequency (RF) magnetron sputtering [7,8], metal organic chemical vapour deposition (MOCVD) [9], pulsed laser deposition (PLD) [10] and solgel process [11,12], have been successfully used to prepare epitaxial, well-oriented and polycrystalline PLZT thin films. The optical properties such as photorefractivity, electrooptic effect, optical waveguides and optical storage in the PLZT thin films were also reported [11,[13][14][15][16][17].…”

Ferroelectric behaviour of PZT thin films with secondary TiO2phase induced defects

“…Lead zirconate titanate (PZT) electroceramic thin films exhibit a wide variation in ferroelectric, piezoelectric and dielectric properties depending on the composition, microstructure and preparatory methods [1,2]. As a result these films have found numerous electronic applications [3,4].…”

Microstructure and Dielectric Properties of YMnO3 Thin Films Prepared by Dip‐Coating

“…Thus, many studies on the preparation of ferroelectric thin films via solution have been reported. 8,9 Very recently, we reported the preparation of YMnO 3 thin films by two types of solution method, a thermal decomposition method and a reflux method, and found that the reflux process drastically improved the reduction of firing temperature and the formation of dense microstructure. 10 The dielectric properties of the thin films must be closely associated with the microstructure of the films.…”