Thin carbon films were deposited by ion beam sputtering at temperatures of 77–1073 K. Using Rutherford backscattering spectrometry and electron energy loss spectroscopy, the trends in film density and bonding were examined as a function of deposition conditions. It has been found that film density and sp3 bonding character unexpectedly increased with increased substrate thermal conductivity and decreasing substrate temperature, reaching values of 2.9 g/cc and 50%, respectively.
Carbon thin films have been prepared by 248 nm excimer laser vaporization of graphite targets. The effect of a variety of process parameters on the film properties is investigated. Deposition at or below room temperature yields diamond-like films with low hydrogen content, high optical transmission, and high resistivity. Electron energy loss spectra indicate sp3 bond fractions of 70–85%. Detailed analyses of the pseudodielectric functions, measured using spectroscopic ellipsometry, show the films to have normal dispersion and an index of refraction of 2.5 in the visible wavelength region. The effects of a low pressure hydrogen background and the use of auxiliary pulsed and dc plasma enhancements are also examined.
Trends in recently reported data on high sp3 fraction (up to 85%), nonhydrogenated amorphous diamond-like carbon films deposited by ion beam sputtering and laser vaporization are examined. The degree of diamondlike film character is found to depend upon the deposition technique as well as the substrate temperature and thermal diffusivity. The data suggest that the combination of incident particle kinetic energy and surface accommodation determine the physical properties of the resultant film. A model is proposed for the condensation of energetic carbon atoms into diamondlike films in which a quench-type surface accommodation mechanism is operative.
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