1995
DOI: 10.1063/1.359609
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Erratum: ‘‘Evidence for field enhanced electron capture by EL2 centers in semi-insulating GaAs and the effect on GaAs radiation detectors’’ [J. Appl. Phys. 75, 7910 (1994)]

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Cited by 18 publications
(38 citation statements)
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“…1 At room temperature the Fermi level is pinned at the EL2 midgap energy level, which is partially ionized and in equilibrium with electrons in the conduction band via trapping ͑coefficient c n ) and emission ͑rate e n ). If the system is driven out of equilibrium by an external driving force, for instance a large electric field, the electron distribution is no longer described by the Boltzmann statistic 5 and the trapping coefficient and emission rate are modified. In SI GaAs the trapping coefficient is found to increase with electric field, leading to negative differential resistance, 2 which is responsible for noise in devices based on SI GaAs substrates, [3][4][5] low frequency current oscillations and high field domain formation.…”
Section: ͓S0003-6951͑96͒03639-x͔mentioning
confidence: 99%
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“…1 At room temperature the Fermi level is pinned at the EL2 midgap energy level, which is partially ionized and in equilibrium with electrons in the conduction band via trapping ͑coefficient c n ) and emission ͑rate e n ). If the system is driven out of equilibrium by an external driving force, for instance a large electric field, the electron distribution is no longer described by the Boltzmann statistic 5 and the trapping coefficient and emission rate are modified. In SI GaAs the trapping coefficient is found to increase with electric field, leading to negative differential resistance, 2 which is responsible for noise in devices based on SI GaAs substrates, [3][4][5] low frequency current oscillations and high field domain formation.…”
Section: ͓S0003-6951͑96͒03639-x͔mentioning
confidence: 99%
“…If the system is driven out of equilibrium by an external driving force, for instance a large electric field, the electron distribution is no longer described by the Boltzmann statistic 5 and the trapping coefficient and emission rate are modified. In SI GaAs the trapping coefficient is found to increase with electric field, leading to negative differential resistance, 2 which is responsible for noise in devices based on SI GaAs substrates, [3][4][5] low frequency current oscillations and high field domain formation. [6][7][8] Theoretically the field enhanced trapping is explained both by a configurational barrier of 60 meV due to a multiphonon capture process which requires an electric field of about 0.5 kV/cm to be overcome 9 or by an enhanced capture of hot electrons in the L valley which occurs at about 3.0 kV/cm.…”
Section: ͓S0003-6951͑96͒03639-x͔mentioning
confidence: 99%
“…Their energy resolution was, however, worse (23.53 keV for 5.486 MeV a-particles and 3.8 keV (3.1%) at 122 keV g-rays) [2]. From this time a new technology of the bulk semi-insulating GaAs has been developed [2][3][4][5][6][7][8][9][10][11][12]. Unfortunately, up to now there are no better results published for a-particles than those reported in Ref.…”
Section: Introductionmentioning
confidence: 46%
“…Unfortunately, the higher bias voltage could not be applied due to surface sparking in the device. Extrapolating measured points, the 100% CCE was expected at about 700 V bias voltage.The CCE [16][17][18][19] and amplitude [4][5][6] as function of the bias voltage show saturation for higher bias voltages; unfortunately, the maximal bias voltage used was not more than 200 V in these works. The bias voltage up to 1000 V was applied in Ref.…”
Section: Operational Characteristicsmentioning
confidence: 98%
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