2009
DOI: 10.1016/j.jcrysgro.2009.03.047
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Epitaxial growth of copper oxide films by reactive cross-beam pulsed-laser deposition

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Cited by 39 publications
(16 citation statements)
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“…4(b). For samples without N 2 plasma treatment, the bandgap is about 1.7 eV, which is a little larger than the CuO film with a bandgap of 1.5 eV [16]; this is due to the mixture of CuO and Cu 2 O. It is found that the optical bandgap of Cu 2 O films with N 2 plasma treatment time of 40 min is 2.42 eV.…”
Section: Resultsmentioning
confidence: 88%
“…4(b). For samples without N 2 plasma treatment, the bandgap is about 1.7 eV, which is a little larger than the CuO film with a bandgap of 1.5 eV [16]; this is due to the mixture of CuO and Cu 2 O. It is found that the optical bandgap of Cu 2 O films with N 2 plasma treatment time of 40 min is 2.42 eV.…”
Section: Resultsmentioning
confidence: 88%
“…Although reasons for this are still debated and different epitaxial relationships have been reported [7,8,13,14], density functional theory calculations show that the Cu 2 O (1 1 0):CuO surface has the lowest energy, and generally the nonpolar Cu 2 O (1 1 0) surfaces have lower energies than the polar Cu 2 O (1 0 0) surfaces [12]. Lattice mismatch seems to be less important than surface energy in determining the preferential growth direction [7].…”
Section: Growth Using Pure Oxygen Plasmamentioning
confidence: 99%
“…Well-controlled artificial cuprite patinas have been produced in many ways, both for corrosion studies, and because cuprite is a semiconductor used (for example) in solar cells. Methods include electrochemical deposition [22,23], ultrasonic spray pyrolysis [24], sputter deposition [25], pulsed laser deposition [26], thermal oxidation [27] and many others.…”
Section: Introductionmentioning
confidence: 99%