Abstract:Research on phase change materials is predominantly focused on their application as memory devices or for temperature control which requires low phase change temperature. The Ge–Se binary chalcogenide glass system with its wide glass‐forming region is a potential candidate for high‐temperature and high‐radiation phase change applications. Herein, the concept of employing Ge
x
Se100−x
glasses to monitor high temperature (450–528 °C) using the phase change effect, is reported. Materials selection, device struct… Show more
“…Heavy ion irradiation of the Ge x Se 100−x thin film with Xe ions with various energies resulted in a structural change with the formation of the GeSe orthorhombic phase. 26 The study of ion irradiationinduced modifications is hitherto for Sb−Se−S chalcogenide thin films. No significant work done by the effect of proton irradiation on the Sb−Se−S system and changes in the related properties has been done.…”
This study investigates the effects of 30 keV proton
ion irradiation
on the structural, morphological, and linear–nonlinear optoelectronic
properties of Sb40Se20S40 thin films.
The retention of an amorphous nature and vibrational bonding rearrangements
caused by ion irradiation demonstrate structural tailoring. The cumulative
decrease in roughness with an increase in ion dose decreases the surface
energy and optical absorption loss. With the blue shifting of the
absorption edges, proton irradiation increased the optical transmittance
and reflectance. The variation of fluence changes the optical bandgap
and Urbach energy, which are induced by local structural changes caused
by defects and disorder. The refractive index decreased considerably,
which supports the Moss rule. Proton irradiation reduced the interband
transition and average band energy gap of the system. However, ion
irradiation increased optical losses while decreasing optical conductivity
and dielectric characteristics. The third-order nonlinear susceptibility
and nonlinear refractive index decreased significantly as the fluence
increased. Such materials with optical tuning capabilities via ion
fluence are essential for cutting-edge photonic and optoelectronic
applications.
“…Heavy ion irradiation of the Ge x Se 100−x thin film with Xe ions with various energies resulted in a structural change with the formation of the GeSe orthorhombic phase. 26 The study of ion irradiationinduced modifications is hitherto for Sb−Se−S chalcogenide thin films. No significant work done by the effect of proton irradiation on the Sb−Se−S system and changes in the related properties has been done.…”
This study investigates the effects of 30 keV proton
ion irradiation
on the structural, morphological, and linear–nonlinear optoelectronic
properties of Sb40Se20S40 thin films.
The retention of an amorphous nature and vibrational bonding rearrangements
caused by ion irradiation demonstrate structural tailoring. The cumulative
decrease in roughness with an increase in ion dose decreases the surface
energy and optical absorption loss. With the blue shifting of the
absorption edges, proton irradiation increased the optical transmittance
and reflectance. The variation of fluence changes the optical bandgap
and Urbach energy, which are induced by local structural changes caused
by defects and disorder. The refractive index decreased considerably,
which supports the Moss rule. Proton irradiation reduced the interband
transition and average band energy gap of the system. However, ion
irradiation increased optical losses while decreasing optical conductivity
and dielectric characteristics. The third-order nonlinear susceptibility
and nonlinear refractive index decreased significantly as the fluence
increased. Such materials with optical tuning capabilities via ion
fluence are essential for cutting-edge photonic and optoelectronic
applications.
“…26 Moreover, their easy formation of acceptor-like Ge vacancies endow germanium chalcogenide with p-type character, which expands the library of p-type semiconductors and provides more options for realizing multifunctional devices. 27–30…”
Low-dimensional group IV-VI metal chalcogenide-based semiconductors hold great promises for opto-electronic device applications owing to their diverses crystalline phases and intriguing properties related to thermoelectric and ferroelectric effects. Here, we...
“…Various energies of gamma rays, electrons, and ions have been used to irradiate P(VDF-TrFE) in studies of the behavior of P(VDF-TrFE) and its impact on P(VDF-TrFE) pyroelectric performance and properties such as dielectricity, ferroelectricity, and electrocaloricity. [37][38][39][40][41] In such bombardment, proton irradiation exhibits strong penetrating power due to its light weight, small band point, and low energy transfer efficiency. Entering the interior of the material more easily than other radiation types, proton irradiation induces cross-linking reactions within the polymer, altering its physicochemical properties.…”
Organic pyroelectric materials are widely applied as temperature sensors in wearable electronic devices due to their good biocompatibility and stability. Real‐time monitoring of the physiological state of the human body requires pyroelectric materials with a fast response time and large output voltage. In this study, the pyroelectric characteristics of poly(vinylidene fluoride–trifluoroethylene) (P(VDF–TrFE)) films are improved with the use of commercial inorganic P‐type bismuth antimonide (P‐Bi2Te3) fillers. Composite films with 0.2 wt% P‐Bi2Te3 increase the pyroelectric response time and voltage by improving the thermal diffusivity and enhancing the β‐phase content, respectively. Proton irradiation results in further improvement of the pyroelectric response time from 22 to 0.5 s. The proton irradiation‐induced ionization energy loss improves the conductivity of the composite films, thereby enhancing the pyroelectric response time. These results show that P‐Bi2Te3 doping is beneficial for improving the pyroelectric properties of P(VDF–TrFE) and that proton irradiation is an effective method for further improving the response time of inorganic–organic composite films.
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