1988
DOI: 10.1016/0022-0248(90)90806-v
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Diffusion mechanisms in II–VI materials

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Cited by 126 publications
(72 citation statements)
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“…This is consistent with results reported by Shaw [5] who suggests that Cu diffusion is independent of the anneal atmosphere (similar diffusion was obtained by annealing in Cd and Te rich overpressures). The proposed diffusion mechanism that would explain this behavior [5] is the formation of Cu-V Cd pairs at the surface, which acts as an infinite source of Cd vacancies, followed by the diffusion of these pairs. The "defect" region for both the samples without Cu (Figure 3-2a) is dominated by a DAP transition at 1.47eV.…”
Section: Photoluminescence Studiessupporting
confidence: 82%
“…This is consistent with results reported by Shaw [5] who suggests that Cu diffusion is independent of the anneal atmosphere (similar diffusion was obtained by annealing in Cd and Te rich overpressures). The proposed diffusion mechanism that would explain this behavior [5] is the formation of Cu-V Cd pairs at the surface, which acts as an infinite source of Cd vacancies, followed by the diffusion of these pairs. The "defect" region for both the samples without Cu (Figure 3-2a) is dominated by a DAP transition at 1.47eV.…”
Section: Photoluminescence Studiessupporting
confidence: 82%
“…[16,17] Die Leerstellenkonzentration innerhalb von Nanokristallen ist bedingt durch die kurzen Diffusionswege und die damit verbundene ausgeprägte Selbstreinigung allerdings äußerst gering. [18][19][20] [21,23] Die Bestimmung der Aktivierungsenergie für den Kationenaustausch der Systeme (1) und (2) [22,24] Entsprechende temperaturabhängige Messungen ergaben für alle PbSe-Proben eine Aktivierungsenergie von 43-48 kJ mol À1 (Abbildung 4b), was mit den Daten aus der Auswertung der Reaktionsgeschwindigkeitskonstanten sehr gut übereinstimmt.…”
Section: Angewandte Zuschriftenunclassified
“…The physical properties of CdTe usually are modified by foreign atoms introduced during the crystals' growth, or by a post-growth diffusion process. [1] Thus, knowing the parameters of the diffusion of impurities is of great importance in developing these electronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…[4] The data demonstrate a tendency to linearity but with poor correlation coefficient R 2 value in some cases, probably, due to lack of appropriate experimental data. Really, it is known that in several diffusion processes for the elemental semiconductors Si and Ge, as well as for the compounds CdS, GaAs, and CdHgTe, among others, it was found that D 0 depends exponentially on the DE [1,[4][5][6][7][8] :…”
Section: Introductionmentioning
confidence: 99%
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