2012 IEEE International Reliability Physics Symposium (IRPS) 2012
DOI: 10.1109/irps.2012.6241922
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Comprehensive modeling of NAND flash memory reliability: Endurance and data retention

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Cited by 33 publications
(12 citation statements)
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“…We propose that the influence of data retention is the main cause for the difference of Tco. Charge loss is usually derived from the direct tunneling, trap assisted tunneling, carrier recombination and diffusion [16], which would distinctively increase at high temperature. Fig.…”
Section: Theoretical Inferencementioning
confidence: 99%
“…We propose that the influence of data retention is the main cause for the difference of Tco. Charge loss is usually derived from the direct tunneling, trap assisted tunneling, carrier recombination and diffusion [16], which would distinctively increase at high temperature. Fig.…”
Section: Theoretical Inferencementioning
confidence: 99%
“…Therefore, for better accuracy, AEP-LDPC (1.086 x 1.187 x 0.991 x 1.006 separates data-retention at RT into two regions, long, when data-retention is dominant, and short, which includes both the effects of data-retention and program-disturb. Moreover, the data-retention effect can be accelerated due to the thermal emission at high temperature conditions [24]. Since the region which includes both data-retention and program-disturb is extremely short at the high temperature [23], the short term effect can almost be ignored.…”
Section: Cell-error Rate (Cer) Parameter Calculation (Unit 3)mentioning
confidence: 99%
“…However, poly-Si contains high density of dangling bonds (DBs) at both grain boundaries and tunnel oxide/poly-Si interface. These DBs act as carrier traps and lead to the degradation on both cell performance [5][6][7] and reliability [8]. For this reason, in 3D NAND fabrication, a passivation process is necessary to remove these traps by using hydrogen species (H) [9][10].…”
Section: Introductionmentioning
confidence: 99%