1995
DOI: 10.1080/10584589508220243
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Characterization of (Ba0.5,Sr0.5)TIO3thin films by the laser ablation technique and their electrical properties with different electrodes

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Cited by 21 publications
(9 citation statements)
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“…Barium strontium titanate, Ba 1Àx Sr x TiO 3 (BST), has attracted a great deal of attention for use in dynamic random access memories (DRAM) due to its relatively high dielectric constant, low leakage current density, high dielectric breakdown strength, and low dissipation factor [1,2]. On the other hand, the nonlinearity of its dielectric properties with respect to applied DC voltage makes it attractive for tunable microwave devices [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…Barium strontium titanate, Ba 1Àx Sr x TiO 3 (BST), has attracted a great deal of attention for use in dynamic random access memories (DRAM) due to its relatively high dielectric constant, low leakage current density, high dielectric breakdown strength, and low dissipation factor [1,2]. On the other hand, the nonlinearity of its dielectric properties with respect to applied DC voltage makes it attractive for tunable microwave devices [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…A detailed survey of the literature revealed that even though some work on dielectric properties of BaTiO3 thin films prepared by sol -gel method (Maneeshya et al, 2013;Hu et al, 2003) , r.f. sputtering (Bhattacharya et al, 1993), pulsed laser ablation (Yoon et al, 1995) and metal-organic chemical vapour deposition (Tahan et al, 1996). So far, there is no report on the preparation of thin films of BaTiO3 on glass substrate by vacuum evaporation method.…”
Section: Introductionmentioning
confidence: 99%
“…Wet chemical method is a promising technique that offers relative low cost, uniform size, homogenous powder and high purity of the ceramics. In addition to that different techniques have also been applied to prepare thin film of barium titanate such as r.f.-sputtering (Bhattacharya et al, 1993), pulsed laser ablation (Yoon et al, 1995) and metal-organic chemical vapour deposition (Tahan et al, 1996). Dent et al, have successfully optimized high velocity oxy-fuel (HVOF) spraying for the deposition of barium titanate as dense thick dielectric layer (25-150 μm) and compared the dielectric constant (k) values of these deposits with those (k) values of BaTiO3 layers produced by plasma spraying.…”
Section: Introductionmentioning
confidence: 99%