Characterization of a reactive broad beam radio-frequency ion source

Abstract

Articles you may be interested inUse of reactive gases with broad-beam radio frequency ion sources for industrial applications A radio-frequency bandpass mass filter for broad ion beamsTo overcome the problems of reactive gases on the lifetime of dc-ion sources for etching and deposition applications a capacitively coupled radio frequency (rf)-ion source has been developed. Details on the source characteristics will be given. The excitation of the ion-source plasma is achieved by an electrical rffield at 27.12 MHz. Different rf-electrode configurations are used. The plasma density is enhanced by a multipolar magnetic field. The ion beam is extracted by a multiaperture three-grid optics to obtain higher ion currents at low-ion energies. At a rf-power of 500 W for oxygen the 2-in. beam diameter leads to an ion current of 40 mA which is equivalent to 2 mA/cm 2 • Data on the beam divergence and the ion energy ofthe beam have been taken. A divergence of2.3 D could be measured. Different reactive and nonreactive gases were tested and the source operates without lifetime problems.

Computer-aided profile optimization of ion-milled microstructures

“…Furthermore, efforts were initiated to overcome the contamination problem by using Si grid systems [10], offering an excellent low-energy extraction behaviour and decreasing the target damage [11]. In addition, the development of alternatives to the well † E-mail: walter@ween01.elektro.uni-wuppertal.de 0965-0393/98/030251+10$19.50 c 1998 IOP Publishing Ltd elaborated Kaufman source was heavily promoted in order to replace argon by typical dry etching gases such as, for example, CF-compounds and O 2 [12][13][14][15]. However, the limits of RIE had not yet been met.…”