Vacuum
 1989
DOI: 10.1016/0042-207x(89)90016-x
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Significance of charge exchange in the determination of yields in broad-beam ion etching

José M. Villalvilla
1
,
Carla Eliete Iochims dos Santos
2
,
JA Vallés-Abarca
3
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Cited by 4 publications
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