2015
DOI: 10.7567/jjap.54.041103
|View full text |Cite
|
Sign up to set email alerts
|

Channel length dependence of field-effect mobility ofc-axis-aligned crystalline In–Ga–Zn–O field-effect transistors

Abstract: Field-effect transistors (FETs) with c-axis-aligned crystalline In-Ga-Zn-O (CAAC-IGZO) active layers have extremely low off-state leakage current. Exploiting this feature, we investigated the application of CAAC-IGZO FETs to LSI memories. A high on-state current is required for the high-speed operation of these LSI memories. The field-effect mobility μ FE of a CAAC-IGZO FET is relatively low compared with the electron mobility of singlecrystal Si (sc-Si). In this study, we measured and calculated the channel l… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
12
0

Year Published

2016
2016
2022
2022

Publication Types

Select...
5
1

Relationship

2
4

Authors

Journals

citations
Cited by 13 publications
(12 citation statements)
references
References 33 publications
(38 reference statements)
0
12
0
Order By: Relevance
“…Although v sat values reported for these materials are somewhat higher than our results for 1L MoS 2 , graphene and thick BP have very small band gaps (0 and <0.3 eV, respectively) and are therefore not well-suited for logic applications. By contrast, the other materials , shown in Figure have only been measured in regimes where they maintain their bulk properties (i.e., thicknesses ≫ 1 nm) and so can only be indirectly compared to 1L MoS 2 . Thus, our measurements of v sat in monolayer MoS 2 provide promising results for logic transistor applications of atomically thin 2D materials.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…Although v sat values reported for these materials are somewhat higher than our results for 1L MoS 2 , graphene and thick BP have very small band gaps (0 and <0.3 eV, respectively) and are therefore not well-suited for logic applications. By contrast, the other materials , shown in Figure have only been measured in regimes where they maintain their bulk properties (i.e., thicknesses ≫ 1 nm) and so can only be indirectly compared to 1L MoS 2 . Thus, our measurements of v sat in monolayer MoS 2 provide promising results for logic transistor applications of atomically thin 2D materials.…”
mentioning
confidence: 99%
“…Summary of saturation velocity versus band gap for various bulk and a few layered materials at room temperature. , With the exception of graphene, which lacks a band gap, 1L MoS 2 is the only atomically thin (sub-1 nm) material shown, yet retains appreciable v sat . (Note the electronic band gap of 1L MoS 2 is greater than the optical gap typically obtained from photoluminescence experiments …”
mentioning
confidence: 99%
“…Figure A shows L dependence of drift mobility of Si FET and OSFET with the same drain voltage. The drift mobility of OSFET was obtained in reference to theoretical studies . Figure A also shows measurement results of field‐effect mobility of the OSFET.…”
Section: Features Of Caac‐igzo Fetmentioning
confidence: 99%
“…The drift mobility of OSFET was obtained in reference to theoretical studies. 30 Figure 12A also shows measurement results of field-effect mobility of the OSFET. The measurement results meet the theoretical studies.…”
Section: Mobility Comparison With Si Fetmentioning
confidence: 99%
“…Actually, high-definition displays and flexible displays using IGZO FETs have been provided [1,2]. In recent years, crystalline IGZO, especially c-axis aligned crystalline IGZO (CAAC-IGZO), have been studied actively [3][4][5][6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%