2016
DOI: 10.1109/led.2016.2598063
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A New High Holding Voltage Dual-Direction SCR With Optimized Segmented Topology

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Cited by 63 publications
(19 citation statements)
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“…The increase in D1 increased the holding voltage of the proposed SCR to 128 V, whereas the increase in D2 considerably increased the holding voltage of the proposed device to 149 V. This was because Qpnp with a base region of relatively high doping concentration exhibits larger increase in base current than Qnpn owing to the structural features of the proposed SCR. Figure 4 shows the TLP curves for various segment topologies in the 4H-SiC process of the proposed SCR [19], [20]. The experimental results reveal that It2 losses, which are caused by the small Si emitter, hardly occurred in 4H-SiC with relatively high robustness, and the holding voltage of the proposed device significantly increased to 169 V. This indicates that the segment topology used in the 4H-SiC SCR is very effective.…”
Section: Measurement Results and Discussionmentioning
confidence: 98%
See 1 more Smart Citation
“…The increase in D1 increased the holding voltage of the proposed SCR to 128 V, whereas the increase in D2 considerably increased the holding voltage of the proposed device to 149 V. This was because Qpnp with a base region of relatively high doping concentration exhibits larger increase in base current than Qnpn owing to the structural features of the proposed SCR. Figure 4 shows the TLP curves for various segment topologies in the 4H-SiC process of the proposed SCR [19], [20]. The experimental results reveal that It2 losses, which are caused by the small Si emitter, hardly occurred in 4H-SiC with relatively high robustness, and the holding voltage of the proposed device significantly increased to 169 V. This indicates that the segment topology used in the 4H-SiC SCR is very effective.…”
Section: Measurement Results and Discussionmentioning
confidence: 98%
“…Here, Qpnp forms a base region at a high N-drift doping concentration, has low current gain (β), and diminishes the positive feedback of the SCR. Additionally, the Qnpn and Qpnp emitters are separated by applying segment topology [19], [20]. Therefore, the proposed device has very high holding voltage owing to its structural characteristics.…”
Section: Novel 4h-sic Based Scr Structurementioning
confidence: 99%
“…6 shows the segment topology implemented in the proposed device using the 0.13 um BCD process [17]. The segment topology can effectively increase the holding voltage without increasing the ESD current discharge length [18]. This study utilizes a 1:1 segment ratio (one emitter to one tie-down area) for high-voltage applications Fig.7 shows the TLP curves of the proposed ESD protection device with segment ratios varying from 0 to 11.…”
Section: Introductionmentioning
confidence: 99%
“…Guan et al used a nested structure to significantly improve the SCR holding voltage and achieve high ESD robustness [10]. Many researchers have proposed other methods to improve the ESD characteristics of SCR devices [11][12][13][14][15][16][17][18][19]. And it is commonly accepted that the conduction path of the device directly affects the SCR test indicators.…”
Section: Introductionmentioning
confidence: 99%