Since research on artificial intelligence has begun receiving much attention, interest in efficient hardware that can process a complex and large amount of information has also increased. The existing von Neumann computing architecture has significant limitations in terms of speed and energy efficiency. Volatile memristors are the most promising among several emerging memory semiconductor devices, because they have various features suitable for neuro-inspired applications. Therefore, a comprehensive review of volatile memristors is urgently needed for future research. Herein, we present the physical interpretation and latest research trends of the switching mechanisms of volatile memristors. We also review diverse promising applications using volatile memristors. In particular, we focus on selectors for array structures, synaptic devices for neuromorphic engineering, imitation of nociceptors, and reservoir computing for time-dependent input data processing. Finally, we discuss the future directions of volatile memristors and their applications.
In this work, we fabricated an ITO/WOX/TaN memristor device by reactive sputtering to investigate resistive switching and conduct analog resistive switching to implement artificial synaptic devices. The device showed good pulse endurance (104 cycles), a high on/off ratio (>10), and long retention (>104 s) at room temperature. The conduction mechanism could be explained by Schottky emission conduction. Further, the resistive switching characteristics were performed by additional pulse-signal-based experiments for more practical operation. Lastly, the potentiation/depression characteristics were examined for 10 cycles. The results thus indicate that the WOX-based devices are appropriate candidates for synaptic devices as well as next-generation nonvolatile memory.
Nitride film played an essential role as an excellent diffusion barrier in the semiconductor field for several decades. In addition, interest in next-generation memories induced researchers’ attention to nitride film as a new storage medium. A Pt/AlN/TaN device was investigated for resistive random-access memory (RRAM) application in this work. Resistive switching properties were examined in the AlN thin film formed by atomic layer deposition (ALD). The unique switching feature conducted under the positive voltage was investigated, while the typical bipolar switching was conducted under the application of negative voltage. Good retention and DC, and pulse endurances were achieved in both conditions and compared to the memory performances. Finally, the electronic behaviors based on the unique switching feature were analyzed through X-ray photoelectron spectroscopy (XPS) and the current–voltage (I–V) linear fitting model.
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