This article presents an overview of the ''Nanolith'' parallel electron-beam ͑e-beam͒ lithography approach. The e-beam writing head consists of an array of microguns independently driven by an active matrix complementary metal-oxide-semiconductor circuit. At the heart of each microgun is a field-emission microcathode comprised of an extraction gate and vertical carbon nanotube emitter, whose mutual alignment is critical in order to achieve highly focused electron beams. Thus, in this work, a single-mask, self-aligned technique is developed to pattern the extraction gate, insulator, and nanotubes in the microcathode. The microcathode examined here (150ϫ150 gates, 2 m gate diameter, with multiple nanotubes per gate͒ exhibited a peak current of 10.5 A at 48 V when operated with a duty cycle of 0.5%. The self-aligned process was extended to demonstrate the fabrication of single nanotube-based microcathodes with submicron gates.
A method for measuring acid generation efficiency is presented and utilized to determine the relative efficiency of four photoacid generators (PAGs) upon radiation with photon, electron, and ion beams. In this method, chemically amplified resists are prepared with varying amounts of base, coated into thin films (1000 AA), and exposed. Linear plots of the base concentration against the threshold exposure dose for each resist yield the threshold acid concentration and the acid generation rate constant for each PAG. The acid-generating efficiency of the four PAGs (ND-Tf, TPS-Tf, TBI-PFOS, and TBI-Tf) upon irradiation with DUV (248 nm), EUV (13.4 nm), X-ray (1 nm), e beam (30 and 50 keV), and He+ ions is evaluated
Ion projection facilitates a direct structuring, which Is an attractive potential manufacturing process for patterned storage media. An advantage to this method is that the media roughness remaines unchanged. The feasibility of ion projection direct structuring for processing full disk surfaces was investigated using a next generation lithography projector. Co-Pt multilayer films with strong perpendicular anisotropy were deposited on 1-in glass disks as used in the IBM microdrive and on Si substrates. Concentric tracks including data, as well as head positioning servo structures, were patterned in a single exposure step with 45 keV He+ at a 4 x demagnification. In a second experiment, sub-100-nm magnetic islands were produced using projection at 8.7 x demagnification and visualized by magnetic force microscopy
Articles you may be interested inThree-dimensional electron-beam lithography using an all-dry resist process ArF surface modification resist process with enhanced water sorption ability
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.