Stress measurements on nickel silicide films formed by the reaction of evaporated nickel films with both amorphous and monocrystalline silicon substrates are presented. By comparison with structural investigations it is shown that the formation of the silicides in the films is connected with stress changes. These stress changes are given for several silicides.Es werden Spannungsmessnngen an Nickelsilizidschichten vorgestellt, die durch Reaktion von aufgedampften Nickelschichten sowohl mit amorphen 81s auch mit einkristallinen Siliziumsubstraten entstanden sind. Der Vergleich mit Strukturuntersuchungen zeigt, daB die Bildung der Silizide in den Schichten mit Spannungsiinderungen verbunden ist. D i m werden fur einige Silizide angegeben.
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