Stresses in thin nickel silicide films

Effect of heat treatment on stress in amorphous silicon films

“…In the course of investigations of the mechanical stresses connected with the growth of nickel silicides during heat treatment of double sandwich layers of amorphous silicon and polycrystalline nickel and of nickel films on single crystal silicon (2) we measured also the stresses in amorphous silicon films. The Newton ring method (3) was used for these measurements.…”