The use of alkaline electroplating baths is the essential requirement to deposit Cu directly onto steels because of non-adherent Cu formation by replacement reaction between Cu 2 + and Fe in acidic solution. For the development of such an electroplating bath, complexing agents to form soluble Cu complex in alkaline pH is necessary at first. Secondary, the soluble Cu complex must be reduced electrochemically. Cyanide-based baths meet these requirements, but the bath is toxic. In this study, the survey of complexing agents revealed that citric and tartaric acids form soluble copper complex solutions in alkaline pH, and electroplating is possible. The cathodic current density range to obtain smooth and adhesive electroplating with citrate complexed bath was extensive than that with a tartrate bath. It was found that 0.1 mol dm − 3 CuSO 4-0.5 mol dm − 3 citric acid baths with pH of 9-11 are optimum to obtain adhesive and uniform Cu layer. Copper electroplating with an acidic CuSO 4-H 2 SO 4 bath was possible on 1 μm Cu layer with the alkaline citrate bath. Because the plating rate is high with the acidic bath, the multilayer Cu electroplating from the citrate bath and then an acidic sulfate bath gives a reasonable way for Cu coating onto steels. Elongation test of the steel sheet electroplated with the multilayer Cu showed that detachment of the Cu layer was limited in the vicinity of the broken part of the sheet. It is concluded that the toxic cyanide Cu plating bath can be replaced with a citrate bath.
This study introduces research trends in the electronics materials, such as joining materials including high-temperature lead-free solder, sintered materials using metal particles and transient liquid phase (TLP) materials, and conductive materials such as aluminum and copper alloys. These studies include the content of the special issue published in Materials Transactions (Vol. 57, No. 6 and Vol. 60,No. 6) entitled Frontier Researches Related to Interconnection, Packaging and Microjoining Materials and Microprocessing for Such Materials. It also introduces interesting research contents, leading the development of next-generation electronics.
Herein we present an experimental investigation on the toughness evaluation method for the samples of copper and aluminum, which are generally employed as electronic equipment parts, through the miniaturized version of the Charpy impact test. Overall, the resulting high reproducibility of the absorbed energy values informed by the miniaturized Charpy impact test can be witnessed; moreover, it is possible to compare the values given by the Japanese industrial standard (JIS) Charpy impact test to those given by the miniaturized Charpy impact test and correction factors were calculated accordingly. [
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