A ferroelectric semiconductor field-effect transistor (FeS-FET) was proposed and experimentally demonstrated for the first time. In this novel FeS-FET, a two-dimensional (2D) ferroelectric semiconductor α-In2Se3 is used to replace conventional semiconductor as channel.α-In2Se3 is identified due to its proper bandgap, room temperature ferroelectricity, the ability to maintain ferroelectricity down to a few atomic layers and the feasibility for large-area growth.An atomic-layer deposition (ALD) Al2O3 passivation method was developed to protect and enhance the performance of the α-In2Se3 FeS-FETs. The fabricated FeS-FETs exhibit high performance with a large memory window, a high on/off ratio over 10 8 , a maximum on-current of 671 μA/μm, high electron mobility of 488 cm 2 /V•s, and the potential to exceed the existing Fe-FETs for non-volatile memory applications.

Collective interactions in functional materials can enable novel macroscopic properties like insulator-to-metal transitions. While implementing such materials into field-effect-transistor technology can potentially augment current state-of-the-art devices by providing unique routes to overcome their conventional limits, attempts to harness the insulator-to-metal transition for high-performance transistors have experienced little success. Here, we demonstrate a pathway for harnessing the abrupt resistivity transformation across the insulator-to-metal transition in vanadium dioxide (VO2), to design a hybrid-phase-transition field-effect transistor that exhibits gate controlled steep (‘sub-kT/q') and reversible switching at room temperature. The transistor design, wherein VO2 is implemented in series with the field-effect transistor's source rather than into the channel, exploits negative differential resistance induced across the VO2 to create an internal amplifier that facilitates enhanced performance over a conventional field-effect transistor. Our approach enables low-voltage complementary n-type and p-type transistor operation as demonstrated here, and is applicable to other insulator-to-metal transition materials, offering tantalizing possibilities for energy-efficient logic and memory applications.

A material with reversible temperature change capability under an external electric field, known as the electrocaloric effect (ECE), has long been considered as a promising solid-state cooling solution. However, electrocaloric (EC) performance of EC materials generally is not sufficiently high for real cooling applications. As a result, exploring EC materials with high performance is of great interest and importance. Here, we report on the ECE of ferroelectric materials with van der Waals layered structure (CuInP2S6 or CIPS in this work in particular).Over 60% polarization charge change is observed within a temperature change of only 10 K at Curie temperature. Large adiabatic temperature change (|ΔT|) of 3.3 K, isothermal entropy change (|ΔS|) of 5.8 J kg -1 K -1 at |ΔE|=142.0 kV cm -1 at 315 K (above and near room temperature) are achieved, with a large EC strength (|ΔT|/|ΔE|) of 29.5 mK cm kV -1 . The ECE of CIPS is also investigated theoretically by numerical simulation and a further EC performance projection is provided.Electrocaloric refrigerators using electrocaloric materials are low noise, environmentfriendly and can be scaled down to small dimensions, compared to the common vaporcompression refrigerators. 1-13 Electrocaloric cooling is also much easier and lower cost to realize compared to other field induced cooling techniques such as magnetocaloric and mechanocaloric cooling, because the electric field is easily to be realized and accessible. Thus, electrocaloric effect is promising for future cooling applications, especially in micro-or nano-scale such as onchip cooling. Electrocaloric effect in ferroelectric materials is of special interest because of the large polarization change near the ferroelectric-paraelectric (FE-PE) phase transition temperature 21 TOC.

Historically, memory technologies have been evaluated based on their storage density, cost, and latencies. Beyond these metrics, the need to enable smarter and intelligent computing platforms at a low area and energy cost has brought forth interesting avenues for exploiting non-volatile memory (NVM) technologies. In this paper, we focus on non-volatile memory technologies and their applications to bio-inspired neuromorphic computing, enabling spike-based machine intelligence. Spiking neural networks (SNNs) based on discrete neuronal “action potentials” are not only bio-fidel but also an attractive candidate to achieve energy-efficiency, as compared to state-of-the-art continuous-valued neural networks. NVMs offer promise for implementing both area- and energy-efficient SNN compute fabrics at almost all levels of hierarchy including devices, circuits, architecture, and algorithms. The intrinsic device physics of NVMs can be leveraged to emulate dynamics of individual neurons and synapses. These devices can be connected in a dense crossbar-like circuit, enabling in-memory, highly parallel dot-product computations required for neural networks. Architecturally, such crossbars can be connected in a distributed manner, bringing in additional system-level parallelism, a radical departure from the conventional von-Neumann architecture. Finally, cross-layer optimization across underlying NVM based hardware and learning algorithms can be exploited for resilience in learning and mitigating hardware inaccuracies. The manuscript starts by introducing both neuromorphic computing requirements and non-volatile memory technologies. Subsequently, we not only provide a review of key works but also carefully scrutinize the challenges and opportunities with respect to various NVM technologies at different levels of abstraction from devices-to-circuit-to-architecture and co-design of hardware and algorithm.

In this paper, we describe and analytically substantiate an alternate explanation for the negative capacitance (NC) effect in ferroelectrics (FE). We claim that the NC effect previously demonstrated in resistance-ferroelectric (R-FE) networks does not necessarily validate the existence of “S” shaped relation between polarization and voltage (according to Landau theory). In fact, the NC effect can be explained without invoking the “S”-shaped behavior of FE. We employ an analytical model for FE (Miller model) in which the steady state polarization strictly increases with the voltage across the FE and show that despite the inherent positive FE capacitance, reduction in FE voltage with the increase in its charge is possible in a R-FE network as well as in a ferroelectric-dielectric (FE-DE) stack. This can be attributed to a large increase in FE capacitance near the coercive voltage coupled with the polarization lag with respect to the electric field. Under certain conditions, these two factors yield transient NC effect. We analytically derive conditions for NC effect in R-FE and FE-DE networks. We couple our analysis with extensive simulations to explain the evolution of NC effect. We also compare the trends predicted by the aforementioned Miller model with Landau-Khalatnikov (L-K) model (static negative capacitance due to “S”-shape behaviour) and highlight the differences between the two approaches. First, with an increase in external resistance in the R-FE network, NC effect shows a non-monotonic behavior according to Miller model but increases according to L-K model. Second, with the increase in ramp-rate of applied voltage in the FE-DE stack, NC effect increases according to Miller model but decreases according to L-K model. These results unveil a possible way to experimentally validate the actual reason of NC effect in FE.

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