The electrodeposition of p-Cu2O layers on Co/p-Si planar structures for potential application as p/metal/p metal base transistors were investigated. The deposits were prepared from electrolytes containing lactic acid and copper sulphate and characterized by Rutherford Backscattering Spectrometry (RBS), X - Ray Diffraction (XRD), and Transmission Electron Microscopy (TEM). The formation of Cu2O/Co Schottky interfaces was confirmed by electrical measurements.
Presented in this work are the mechanisms of Cu plating onto (100) Si surfaces in diluted hydrofluoric acid (D-HF) solutions containing CuSO4 or CuCl2. For D-HF/CuSO4 baths, it was observed that: (a) Si dissolution occurs; (b) For each atom of Cu which plates, one atom of Si is consumed; (c) Si oxidation occurs at the Cu/Si interface; (d) Bubbles of an inflammable gas were uniformly distributed over the Cu films. Also, for D-HF/CuCl2 baths, it was observed that: (e) Si dissolution occurs; (f) for each two atoms of Cu which plate, one atom of Si is consumed; (g) Oxygen was detected across the Cu films; (h) No bubble of gas appeared. Based on these observations, Si oxidation followed by silicon oxide etching was inferred to occur during Cu plating in D-HF/CuSO4 baths and Si dissolution induced by fluorine ions was inferred to occur during Cu plating in D-HF/CuCl2 baths.
Presented in this work is a measurement method to obtain the Equivalent Oxide Thickness (EOT) using the tunneling current regime for ultra-thin gate dielectrics ranging from 1.5 to 16 nm. With the aid of the I-V characteristic of MOS capacitors in a low electric-field range (5-7 MV/cm), EOT was obtained from the slope of the ln(I/V ox 2 ) versus 1/V ox graph for direct or FowlerNordheim tunneling current regimes. The average EOT uniformity was obtained for representative populations of tested MOS capacitors (at least a hundred per wafer) and, comparing with the results obtained from C-V measurements, the method was validated.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.