We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50 nm features over a 2×2 cm2 area which are reproducible with high fidelity. Data of printing 15 nm features in PMMA using a Cr stamp was obtained.

The direct patterning of functional semiconducting polymers (see Figure) has been achieved with a nanoimprint lithography technique. The room‐temperature process described is time‐saving as repeated temperature cycling is not required. In addition, due to the direct patterning approach the need for further processing steps (plasma treatment) to pattern the underlying semiconducting material is eliminated.

No abstract

No abstract

No abstract