Hexagonal boron nitride (hBN) has emerged as an important material for various device applications and as a template for graphene electronics. Low-dimensional hBN is expected to possess rich physical properties, similar to graphene. The synthesis of wafer-scale semiconducting hBN epitaxial layers with high crystalline quality and electrical conductivity control has not been achieved but is highly desirable. Large area hBN epitaxial layers (up to 2 in. in diameter) were synthesized by metal organic chemical vapor deposition. P-type conductivity control was attained by in situ Mg doping. Compared to Mg-doped wurtzite AlN, which possesses a comparable energy band gap (∼6 eV), dramatic reductions in Mg acceptor energy level and P-type resistivity (by about six to seven orders of magnitude) have been realized in hBN epilayers. The ability of conductivity control and wafer-scale production of hBN opens up tremendous opportunities for emerging applications, ranging from revolutionizing p-layer approach in III-nitride deep ultraviolet optoelectronics to graphene electronics.

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Recent advances in epitaxial growth and demonstration of p-type conductivity in hexagonal boron nitride (hBN) epilayers represent an exceptional opportunity to revolutionize player approach and overcome the intrinsic problem of low p-type conductivity in Al-rich AlGaN for deep ultraviolet (DUV) device applications. Nevertheless, the ability of epitaxial growth of hBN on AlGaN is a prerequisite for the incorporation of p-type hBN in AlGaN DUV device structures. We report on the epi-growth of hBN on Al-rich AlGaN/AlN/Al 2 O 3 templates using metal organic chemical vapor deposition. X-ray diffraction measurement revealed a 2h peak at 26.5 which indicates that the BN epilayers are hexagonal and consist of a single phase. Mg doped hBN epilayers were also grown on highly insulating AlN and n-type AlGaN templates with an attempt to demonstrate hBN/AlGaN p-n junctions. Mg doped hBN epilayers grown on insulating templates were p-type with an in-plane resistivity of $2.3 X cm. Diode behavior in the p-n structures of p-hBN/ n-Al x Ga 1Àx N (x $ 0.62) has been demonstrated. The results here reveal the feasibility of using highly conductive p-type hBN as an electron blocking and p-contact layers for AlGaN deep UV emitters. V

Solid-state thermal neutron detectors with improved detection efficiencies are highly sought after for many applications. Hexagonal boron nitride (hBN) epilayers have been synthesized by metal organic chemical vapor deposition on sapphire substrates. Important material parameters including the mobility-lifetime (μτ) product and the thermal neutron absorption length (λ) have been measured. For hBN epilayers with a room temperature resistivity of 5.3 Â 10 10 Ω cm, the measured μτ product of electrons is 4.46 Â 10 À 8 cm 2 /V and of holes is 7.07 Â 10 À 9 cm 2 /V. The measured λ values are 277 μm and 77 μm for natural and 10 B enriched hBN epilayers, respectively. Metal-semiconductor-metal detectors incorporating 0.3 mm thick hBN epilayers were fabricated. The reaction product pulse-height spectra were measured under thermal neutron irradiation produced by a 252 Cf source moderated by high density polyethylene block. The measured pulse-height spectra revealed distinguishable peaks corresponding to the product energies of 10 B and neutron reaction with the 0.84 MeV 7 Li peak being the most prominent. The detectors exhibited negligible responses to gamma rays produced by 137 Cs decay. Our results indicate that hBN epilayers are highly promising for realizing highly sensitive solid-state thermal neutron detectors with expected advantages resulting from semiconductor technologies, including compact size, light weight, ability to integrate with other functional devices, and low cost.