A new model is presented of the electroformed metal-insulator-metal
structure which explains its various properties including electron emission,
electroluminescence, memory effects and, for the first time, a complete
account of the differential negative resistance. The model is based upon
experiments which identify the conduction process to be trap-controlled
thermally activated tunnelling between metal islands produced in the forming
process. The implications for the production of commercial electroformed devices are discussed.
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