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Scanning capacitance microscopy (SCM) has been investigated on Ga doped ZnO staircase multi‐layers grown by molecular beam epitaxy (MBE) and ZnO NWs grown by chemical bath deposition (CBD). It is found that SCM data amplitude experiences a monotonic decrease with increasing Ga concentration from 2×1017 cm‐3 to 3×1020 cm‐3, indicating SCM being an appropriate technique for two dimensional dopant/carrier profiling in ZnO at nanoscale. For ZnO nanowires (NWs), a planariz‐ation process was developed based on dip‐coating of silica sol‐gel and chemical‐mechanical polishing. Then ZnO NWs were well detected from the silica matrix by SCM and the residual carrier concentration inside them was estimated through calibration method to be between 5×1017 cm‐3 and 2×1018 cm‐3. Finally, the result was compared with that obtained from conventional capacitance‐voltage (C‐V) measrement and their difference was discussed. (© 2016 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Scanning spreading resistance microscopy (SSRM) was performed on non-intentionally doped (nid) ZnO nanowires (NWs) grown by metal-organic chemical vapor deposition in order to measure their residual carrier concentration. For this purpose, an SSRM calibration profile has been developed on homoepitaxial ZnO:Ga multilayer staircase structures grown by molecular beam epitaxy. The Ga density measured by SIMS varies in the 1.7 × 1017 cm−3 to 3 × 1020 cm−3 range. From measurements on such Ga doped multi-layers, a monotonic decrease in SSRM resistance with increasing Ga density was established, indicating SSRM being a well-adapted technique for two dimensional dopant/carrier profiling on ZnO at nanoscale. Finally, relevant SSRM signal contrasts were detected on nid ZnO NWs, and the residual carrier concentration is estimated in the 1–3 × 1018 cm−3 range, in agreement with the result from four-probe measurements.