The authors report on fabrication and characterization of a polymeric spin valve with the conjugated polymer regioregular (poly 3-hexylthiophene) (RRP3HT) as the spacer layer. The device structure is La0.67Sr0.33MnO3 (LSMO)/polymer/Co, with half-metallic, spin-polarized LSMO acting as the spin-injecting electrode. The spin valve shows behavior similar to a magnetic tunnel junction though the nonmagnetic spacer layer (∼100nm) is much thicker than the tunneling limit. They attribute this behavior to the formation of a thin spin-selective tunneling interface between LSMO and RRP3HT caused by RRP3HT, chemically attaching to LSMO as observed by x-ray photoelectron spectroscopy measurement. This gives rise to ∼80% magnetoresistance (MR) at 5K and ∼1.5% MR at room temperature. They found that by introducing monolayer of different organic insulators between LSMO and RRP3HT the spin-selective interface is destroyed and the spin injection is reduced. Their results show that organic materials are promising candidates for spintronic applications.

The activation energy of nature-inspired hackmanites was tuned, adapting this material for UV detection.

We propose a combined far ultraviolet (FUV) and thermal annealing method of metal-nitrate-based precursor solutions that allows efficient conversion of the precursor to metal-oxide semiconductor (indium zinc oxide, IZO, and indium oxide, In2O3) both at low-temperature and in short processing time. The combined annealing method enables a reduction of more than 100 °C in annealing temperature when compared to thermally annealed reference thin-film transistor (TFT) devices of similar performance. Amorphous IZO films annealed at 250 °C with FUV for 5 min yield enhancement-mode TFTs with saturation mobility of ∼1 cm2/(V·s). Amorphous In2O3 films annealed for 15 min with FUV at temperatures of 180 °C and 200 °C yield TFTs with low-hysteresis and saturation mobility of 3.2 cm2/(V·s) and 7.5 cm2/(V·s), respectively. The precursor condensation process is clarified with x-ray photoelectron spectroscopy measurements. Introducing the FUV irradiation at 160 nm expedites the condensation process via in situ hydroxyl radical generation that results in the rapid formation of a continuous metal-oxygen-metal structure in the film. The results of this paper are relevant in order to upscale printed electronics fabrication to production-scale roll-to-roll environments.

Using solid-source molecular-beam epitaxy with a rf-plasma source, we have grown GaInNAs/GaAs single-quantum-well lasers operating at 1.32 μm. For a broad-area oxide stripe, uncoated Fabry–Perot laser with a cavity length of 1600 μm, the threshold current density is 546 A/cm2 at room temperature. The internal quantum efficiency for these lasers is 80%, while the materials losses are 7.0 cm−1. A characteristic temperature of 104 K was measured in the temperature range from 20 to 80 °C. Optical output up to 40 mW per facet under continuous-wave operation was achieved for these uncoated lasers at room temperature.

First-principles phase diagrams of bismuth-stabilized GaAs- and InP(100) surfaces demonstrate for the first time the presence of anomalous (2x1) reconstructions, which disobey the common electron counting principle. Combining these theoretical results with our scanning-tunneling-microscopy and photoemission measurements, we identify novel (2x1) surface structures, which are composed of symmetric Bi-Bi and asymmetric mixed Bi-As and Bi-P dimers, and find that they are stabilized by stress relief and pseudogap formation.