Using first-principles atomistic simulations, we study the response of atomically-thin layers of transition metal dichalcogenides (TMDs) -a new class of two-dimensional inorganic materials with unique electronic properties -to electron irradiation. We calculate displacement threshold energies for atoms in 21 different compounds and estimate the corresponding electron energies required to produce defects. For a representative structure of MoS2, we carry out high-resolution transmission electron microscopy experiments and validate our theoretical predictions via observations of vacancy formation under exposure to a 80 keV electron beam. We further show that TMDs can be doped by filling the vacancies created by the electron beam with impurity atoms. Thereby, our results not only shed light on the radiation response of a system with reduced dimensionality, but also suggest new ways for engineering the electronic structure of TMDs. [6,7]. Recently, TMDs with a common structural formula MeX 2 , where Me stands for transition metals (Mo, W, Ti, etc.) and X for chalcogens (S, Se, Te), have received considerable attention. These 2D materials are expected to have electronic properties varying from metals to wide-gap semiconductors, similar to their bulk counterparts [8,9], and excellent mechanical characteristics [10]. The monolayer TMD materials have already shown a good potential in nanoelectronic [3,11,12] and photonic [4,13,14] applications.Characterization of the h-BN [15-17] and TMD [5,6,18] samples has extensively been carried out using high-resolution transmission electron microscopy (HR-TEM). During imaging, however, energetic electrons in the TEM can give rise to production of defects due to ballistic displacements of atoms from the sample and beam-stimulated chemical etching [19], as studies on h-BN membranes also indicate [15][16][17]20].Contrary to h-BN, very little is known about the effects of electron irradiation on TMDs. So far, atomic defects have been observed via HR-TEM in WS 2 nanoribbons encapsulated inside carbon nanotubes at electron acceleration voltage of 60 kV [21] as well as at the edges of MoS 2 clusters under 80 kV irradiation [22], while no significant damage or amorphization was reported for MoS 2 sheets at 200 kV [18] -a surprising result taking into account the relatively low atomic mass of the S atom. Clearly, precise microscopic knowledge of defect production in TMDs under electron irradiation is highly desirable for assessing the effects of the beam on the samples. This knowledge would allow designing experimental conditions required to minimize damage, as well as developing beam-mediated post-synthesis doping techniques. Moreover, information on the displacement thresholds is important in the context of fundamental aspects of the interaction of beams of energetic particles with solids, as the reduced dimensionality may give rise to an irradiation response different from that in the bulk counterpart of the 2D material [23].Here, by employing first-principles simulations, we study the ...

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We calculate from first principles the electronic structure and optical properties of a number of transition metal dichalcogenide (TMD) bilayer heterostructures consisting of MoS2 layers sandwiched with WS2, MoSe2, MoTe2, BN, or graphene sheets. Contrary to previous works, the systems are constructed in such a way that the unstrained lattice constants of the constituent incommensurate monolayers are retained. We find strong interaction between the Γ-point states in all TMD/TMD heterostructures, which can lead to an indirect gap. On the other hand, states near the K-point remain as in the monolayers. When TMDs are paired with BN or graphene layers, the interaction around Γ-point is negligible, and the electronic structure resembles that of two independent monolayers. Calculations of optical properties of the MoS2/WS2 system show that even when the valence and conduction band edges are located in different layers, the mixing of optical transitions is minimal, and the optical characteristics of the monolayers are largely retained in these heterostructures. The intensity of interlayer transitions is found to be negligibly small, a discouraging result for engineering the optical gap of TMDs by heterostructuring.