A review on the growth and characterization of site-selective quantum dots (QDs) is presented. First, a theoretical model is used to describe the mechanism leading to the formation of QDs at pre-defined locations. The structural properties of siteselective QDs was revealed and their optical quality was tested. Various parameters, such as hole size, hole depth, or InAs amount, influencing the QD occupation and the QD size are discussed and possible ways to control these are presented.Ordered QD array with multiple dot nucleation (left) and single QD in dry etched hole (right).
A procedure for obtaining three-dimensionally resolved reciprocal-space maps in a skew X-ray diffraction geometry is described. The geometry allows tuning of the information depth in the range from tens of micrometres for symmetric skew diffraction down to tens of nanometres for strongly asymmetric skew geometries, where the angle of incidence is below the critical angle of total external reflection. The diffraction data are processed using a rotation matrix formalism. The whole three-dimensional reciprocal-space map can be measured by performing a single azimuthal rotation of the sample and using a two-dimensional detector, while keeping the angle of incidence and the X-ray information depth fixed (FIXD method). Having a high surface sensitivity under grazing-incidence conditions, the FIXD method can be applied to a large variety of Bragg reflections, particularly polar ones, which provide information on strain and chemical composition separately. In contrast with conventional grazing-incidence diffraction, the FIXD approach reveals, in addition to the lateral (in-plane) components, the vertical (out-of-plane) component of the strain field, and therefore allows the separation of the scattering contributions of strained epitaxial nanostructures by their vertical misfit. The potential of FIXD is demonstrated by resolving the diffraction signal from a single layer of InGaN quantum dots grown on a GaN buffer layer. The FIXD approach is suited to the study of free-standing and covered near-surface nano-objects, as well as vertically extended multilayer structures.
In this study, we investigated pre-structured (100) GaAs sample surfaces with respect to subsequent site-selective quantum dot growth. Defects occurring in the GaAs buffer layer grown after pre-structuring are attributed to insufficient cleaning of the samples prior to regrowth. Successive cleaning steps were analyzed and optimized. A UV-ozone cleaning is performed at the end of sample preparation in order to get rid of remaining organic contamination.
The number of quantum dots which nucleate at a certain place has to be controllable for device integration. It was shown that the number of quantum dots per nucleation site depends on the size of the hole in the substrate, but other dimensions of the nucleation site are vague. We report on the influence of hole shape on site-selectively grown InAs quantum dots (QDs) by molecular beam epitaxy. Dry etching of the GaAs wafers was used because of its high anisotropic etching characteristic. Therefore, it was possible to verify the influence of several hole shape parameters on the subsequent QD growth independently. We show that the nucleation of these QDs depends on several properties of the hole, namely its surface area, aspect ratio of the surface area, and depth. Especially, the aspect ratio shows a big influence on the number of nucleating QDs per site. With knowledge of these dependencies, it is possible to influence the number of QDs per site and also its distribution.
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